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Ohlin, H., Frisk, T., Sychugov, I. & Vogt, U. (2023). Comparing metal assisted chemical etching of N and P-type silicon nanostructures. Micro and Nano Engineering, 19, Article ID 100178.
Open this publication in new window or tab >>Comparing metal assisted chemical etching of N and P-type silicon nanostructures
2023 (English)In: Micro and Nano Engineering, E-ISSN 2590-0072, Vol. 19, article id 100178Article in journal (Refereed) Published
Abstract [en]

Metal assisted chemical etching is a promising method for fabricating high aspect ratio micro- and nanostructures in silicon. Previous results have suggested that P-type and N-type silicon etches with different degrees of anisotropy, questioning the use of P-type silicon for nanostructures. In this study, we compare processing X-ray zone plate nanostructures in N and P-type silicon through metal assisted chemical etching with a gold catalyst. Fabricated zone plates were cleaved and studied with a focus on resulting verticality, depth and porosity. Results show that for high aspect ratio nanostructures, both N and P-type silicon prove to be viable alternatives exhibiting different etch rates, but similarities regarding porosity and etch direction.

Place, publisher, year, edition, pages
Elsevier BV, 2023
Keywords
MACE, Metal assisted chemical etching, N-type, Nanostructures, P-type, X-ray diffractive optics, Zone plate
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:kth:diva-330938 (URN)10.1016/j.mne.2023.100178 (DOI)001043751200001 ()2-s2.0-85151536658 (Scopus ID)
Note

QC 20230704

Available from: 2023-07-04 Created: 2023-07-04 Last updated: 2024-02-02Bibliographically approved
Kahnt, M., Selberg, J., Vogt, U., Åstrand, M., Björling, A., Kalbfleisch, S., . . . Johansson, U. (2023). Current capabilities of the imaging endstation at the NanoMAX beamline. In: AIP Conference Proceedings: . Paper presented at 15th International Conference on X-ray Microscopy, XRM 2022, Virtual, Online, Taiwan, Jun 19 2022 - Jun 24 2022. AIP Publishing, Article ID 040018.
Open this publication in new window or tab >>Current capabilities of the imaging endstation at the NanoMAX beamline
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2023 (English)In: AIP Conference Proceedings, AIP Publishing , 2023, article id 040018Conference paper, Published paper (Refereed)
Abstract [en]

The new imaging endstation of the NanoMAX beamline is being designed to complement the already existing diffraction endstation: measurements with smaller beams at lower photons energies, with higher stability, in vacuum and with sample cooling at the measurement position, optimized for X-ray fluorescence mapping and ptychographic imaging in two and three spatial dimensions. This comes at the cost of reduced flexibility and fewer degrees of freedom. We hereby present the results of the in-air commissioning of the main components for the new endstation and the data quality that has already been achieved.

Place, publisher, year, edition, pages
AIP Publishing, 2023
Series
AIP Conference Proceedings, ISSN 0094243X
National Category
Accelerator Physics and Instrumentation Atom and Molecular Physics and Optics Condensed Matter Physics
Identifiers
urn:nbn:se:kth:diva-340365 (URN)10.1063/5.0169244 (DOI)2-s2.0-85177551807 (Scopus ID)
Conference
15th International Conference on X-ray Microscopy, XRM 2022, Virtual, Online, Taiwan, Jun 19 2022 - Jun 24 2022
Note

QC 20231206

Available from: 2023-12-06 Created: 2023-12-06 Last updated: 2023-12-06Bibliographically approved
Lindblom, M., Patzauer, M., Vogt, U., Wilbur, S., Yazd, N. S., Tow, K. H., . . . Ebenhag, S. C. (2023). Flexible Liquid-Filled Scintillating Fibers for X-Ray Detection. In: 2023 IEEE SENSORS, SENSORS 2023 - Conference Proceedings: . Paper presented at 2023 IEEE SENSORS, SENSORS 2023, Vienna, Austria, Oct 29 2023 - Nov 1 2023. Institute of Electrical and Electronics Engineers (IEEE)
Open this publication in new window or tab >>Flexible Liquid-Filled Scintillating Fibers for X-Ray Detection
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2023 (English)In: 2023 IEEE SENSORS, SENSORS 2023 - Conference Proceedings, Institute of Electrical and Electronics Engineers (IEEE) , 2023Conference paper, Published paper (Refereed)
Abstract [en]

We present the design and fabrication of flexible, liquid-filled scintillating fibers for X-ray detection made from silica fibers and silica capillaries. The scintillating fibers were characterized using ultraviolet light exposure and we also performed an experiment demonstrating X-ray detection.

Place, publisher, year, edition, pages
Institute of Electrical and Electronics Engineers (IEEE), 2023
Keywords
liquid-filled fibers, scintillating fibers, X-ray detection
National Category
Biophysics
Identifiers
urn:nbn:se:kth:diva-341692 (URN)10.1109/SENSORS56945.2023.10325072 (DOI)001116741300222 ()2-s2.0-85179764298 (Scopus ID)
Conference
2023 IEEE SENSORS, SENSORS 2023, Vienna, Austria, Oct 29 2023 - Nov 1 2023
Note

Part of ISBN 9798350303872

QC 20231229

Available from: 2023-12-29 Created: 2023-12-29 Last updated: 2024-02-29Bibliographically approved
Åstrand, M., Kahnt, M., Johansson, U. & Vogt, U. (2023). Multi-beam ptychography with coded in-line Fresnel zone plates. In: X-Ray Nanoimaging: Instruments and Methods VI: . Paper presented at X-Ray Nanoimaging: Instruments and Methods VI 2023, San Diego, United States of America, Aug 23 2023 - Aug 24 2023. SPIE-Intl Soc Optical Eng, Article ID 1269807-1.
Open this publication in new window or tab >>Multi-beam ptychography with coded in-line Fresnel zone plates
2023 (English)In: X-Ray Nanoimaging: Instruments and Methods VI, SPIE-Intl Soc Optical Eng , 2023, article id 1269807-1Conference paper, Published paper (Refereed)
Abstract [en]

X-ray ptychography is often implemented for nanoimaging at synchrotron radiation sources and extensions are being developed to make experiments faster. This work is on multi-beam ptychography with Fresnel zone plates that have a small lateral separation, enabling the imaging of an extended field of view without increasing exposure time. Sectional zone inversion is implemented for coding respective probes and up to three Fresnel zone plates are successfully used in parallel. The speed-up achieved, compared to single beam ptychography, is linear with the number of probes. The combination of versatility of the fabrication process for the Fresnel zone plates and performance enhancement by scanning in multi-beam mode makes this an optimal solution for studying samples fast and obtaining enlarged fields of view.

Place, publisher, year, edition, pages
SPIE-Intl Soc Optical Eng, 2023
Keywords
Fresnel zone plate, multi-beam, ptychography
National Category
Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:kth:diva-339976 (URN)10.1117/12.2676657 (DOI)2-s2.0-85176504471 (Scopus ID)
Conference
X-Ray Nanoimaging: Instruments and Methods VI 2023, San Diego, United States of America, Aug 23 2023 - Aug 24 2023
Note

Part of ISBN 9781510666108

QC 20231127

Available from: 2023-11-27 Created: 2023-11-27 Last updated: 2023-11-27Bibliographically approved
Ohlin, H., Frisk, T. & Vogt, U. (2023). Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns. Micromachines, 14(4), Article ID 766.
Open this publication in new window or tab >>Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns
2023 (English)In: Micromachines, E-ISSN 2072-666X, Vol. 14, no 4, article id 766Article in journal (Refereed) Published
Abstract [en]

Lift-off processing is a common method of pattern transfer for different nanofabrication applications. With the emergence of chemically amplified and semi-amplified resist systems, the possibilities for pattern definition via electron beam lithography has been widened. We report a reliable and simple lift-off process for dense nanostructured pattern in CSAR62. The pattern is defined in a single layer CSAR62 resist mask for gold nanostructures on silicon. The process offers a slimmed down pathway for pattern definition of dense nanostructures with varied feature size and an up to 10 nm thick gold layer. The resulting patterns from this process have been successfully used in metal assisted chemical etching applications.

Place, publisher, year, edition, pages
MDPI AG, 2023
Keywords
lift-off, single layer, electron beam lithography, CSAR62, X-ray diffractive optics, zone plate, nanostructures, nanofabrication
National Category
Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:kth:diva-326871 (URN)10.3390/mi14040766 (DOI)000977289200001 ()37420999 (PubMedID)2-s2.0-85156107524 (Scopus ID)
Note

QC 20230515

Available from: 2023-05-15 Created: 2023-05-15 Last updated: 2024-02-02Bibliographically approved
Ohlin, H., Frisk, T., Åstrand, M. & Vogt, U. (2022). Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures. Micromachines, 13(3), Article ID 452.
Open this publication in new window or tab >>Miniaturized Sulfite-Based Gold Bath for Controlled Electroplating of Zone Plate Nanostructures
2022 (English)In: Micromachines, E-ISSN 2072-666X, Vol. 13, no 3, article id 452Article in journal (Refereed) Published
Abstract [en]

X-ray zone plates made from gold are common optical components used in X-ray imaging experiments. These nanostructures are normally fabricated using a combination of electron-beam lithography and gold electroplating with cyanide gold baths. In this study, we present a gold electroplating process in a miniaturized gold-suplphite bath. The miniaturization is enabled by on-chip reference plating areas with well defined sizes, offering a reliable way to control the height of the structures by carefully choosing the plating time at a given current density in accordance with a calibration curve. Fabricated gold zone plates were successfully used in X-ray imaging experiments with synchrotron radiation. Although gold electroplating of nanostructures is a well-established method, details about the actual process are often missing in the literature. Therefore, we think that our detailed descriptions and explanations will be helpful for other researchers that would like to fabricate similar structures.

Place, publisher, year, edition, pages
MDPI AG, 2022
Keywords
X-ray diffractive optics, zone plate, gold electroplating
National Category
Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:kth:diva-311044 (URN)10.3390/mi13030452 (DOI)000774117300001 ()35334744 (PubMedID)2-s2.0-85127418184 (Scopus ID)
Note

QC 20220420

Available from: 2022-04-20 Created: 2022-04-20 Last updated: 2024-02-02Bibliographically approved
Åstrand, M., Frisk, T., Ohlin, H. & Vogt, U. (2022). Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers. Micro and Nano Engineering, 16, 100141, Article ID 100141.
Open this publication in new window or tab >>Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers
2022 (English)In: Micro and Nano Engineering, E-ISSN 2590-0072, Vol. 16, p. 100141-, article id 100141Article in journal (Refereed) Published
Abstract [en]

Electron-beam lithography (EBL) is a relevant technique to the nanoscience community as it enables the production of precise structures at the nanoscale. When writing features in a thick resist layer, dose insufficiency is typically encountered when resolution approaches the focal spot of the electron beam itself. We present a study of this phenomenon, a theory for its understanding and compensation, and a method for the assignment of the correct area dose for writing small features. Dose insufficiency originates from the proximity effect distributing energy in volumes of resist that are larger than intended. Based on a simple interpretation of the spread, a proximity effect correction (PEC) algorithm was established. Implementing this, we could realize high-quality nanostructures with direct-write 50 kV EBL on AR-P 6200 (CSAR 62) resist. The latter translates to quick and inexpensive exposures that offer good compatibility with further processes.

Place, publisher, year, edition, pages
Elsevier BV, 2022
Keywords
Nanofabrication, Electron-beam lithography, Proximity effect correction, Chemically semi-amplified resist
National Category
Nano Technology
Identifiers
urn:nbn:se:kth:diva-314197 (URN)10.1016/j.mne.2022.100141 (DOI)000807268100002 ()2-s2.0-85130558059 (Scopus ID)
Funder
Swedish Research Council, 2018–04237Swedish Research Council, 2019–06104
Note

QC 20220617

Available from: 2022-06-17 Created: 2022-06-17 Last updated: 2024-02-13Bibliographically approved
Johansson, U., Carbone, D., Kalbfleisch, S., Bjorling, A., Kahnt, M., Sala, S., . . . Vogt, U. (2021). NanoMAX: the hard X-ray nanoprobe beamline at the MAX IV Laboratory. Journal of Synchrotron Radiation, 28, 1935-1947
Open this publication in new window or tab >>NanoMAX: the hard X-ray nanoprobe beamline at the MAX IV Laboratory
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2021 (English)In: Journal of Synchrotron Radiation, ISSN 0909-0495, E-ISSN 1600-5775, Vol. 28, p. 1935-1947Article in journal (Refereed) Published
Abstract [en]

NanoMAX is the first hard X-ray nanoprobe beamline at the MAX IV laboratory. It utilizes the unique properties of the world's first operational multi-bend achromat storage ring to provide an intense and coherent focused beam for experiments with several methods. In this paper we present the beamline optics design in detail, show the performance figures, and give an overview of the surrounding infrastructure and the operational diffraction endstation.

Place, publisher, year, edition, pages
International Union of Crystallography (IUCr), 2021
Keywords
hard X-ray nanoprobes, coherent diffractive imaging, scanning X-ray microscopy, scanning X-ray diffraction
National Category
Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:kth:diva-305371 (URN)10.1107/S1600577521008213 (DOI)000715906300029 ()34738949 (PubMedID)2-s2.0-85118848173 (Scopus ID)
Note

QC 20211130

Available from: 2021-11-30 Created: 2021-11-30 Last updated: 2022-06-25Bibliographically approved
Akan, R. & Vogt, U. (2021). Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures. Nanomaterials, 11(11), Article ID 2806.
Open this publication in new window or tab >>Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
2021 (English)In: Nanomaterials, E-ISSN 2079-4991, Vol. 11, no 11, article id 2806Article in journal (Refereed) Published
Abstract [en]

High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical stability at high aspect ratios and maintaining a vertical etching profile. In this work, we investigated the etching behavior of two zone plate catalyst designs in a systematic manner at four different MACE conditions as a function of mechanical stability and etching verticality. The zone plate catalyst designs served as models for Si nanostructures over a wide range of feature sizes ranging from 850 nm to 30 nm at 1:1 line-to-space ratio. The first design was a grid-like, interconnected catalyst (brick wall) and the second design was a hybrid catalyst that was partly isolated, partly interconnected (fishbone). Results showed that the brick wall design was mechanically stable up to an aspect ratio of 30:1 with vertical Si structures at most investigated conditions. The fishbone design showed higher mechanical stability thanks to the Si backbone in the design, but on the other hand required careful control of the reaction kinetics for etching verticality. The influence of MACE reaction kinetics was identified by lowering the oxidant concentration, lowering the processing temperature and by isopropanol addition. We report an optimized MACE condition to achieve an aspect ratio of at least 100:1 at room temperature processing by incorporating isopropanol in the etching solution.

Place, publisher, year, edition, pages
MDPI AG, 2021
Keywords
metal-assisted chemical etching, Si nanostructures, high aspect ratio, zone plate
National Category
Other Physics Topics
Identifiers
urn:nbn:se:kth:diva-306369 (URN)10.3390/nano11112806 (DOI)000724502400001 ()34835572 (PubMedID)2-s2.0-85118138491 (Scopus ID)
Note

QC 20211215

Available from: 2021-12-15 Created: 2021-12-15 Last updated: 2022-06-25Bibliographically approved
Branny, A., Didier, P., Zichi, J., Zadeh, I. E., Steinhauer, S., Zwiller, V. & Vogt, U. (2021). X-Ray Induced Secondary Particle Counting With Thin NbTiN Nanowire Superconducting Detector. IEEE transactions on applied superconductivity (Print), 31(4), Article ID 2200305.
Open this publication in new window or tab >>X-Ray Induced Secondary Particle Counting With Thin NbTiN Nanowire Superconducting Detector
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2021 (English)In: IEEE transactions on applied superconductivity (Print), ISSN 1051-8223, E-ISSN 1558-2515, Vol. 31, no 4, article id 2200305Article in journal (Refereed) Published
Abstract [en]

We characterized the performance of abiased superconducting nanowire to detect X-ray photons. The device, made of a 10 nm thin NbTiN film and fabricated on a dielectric substrate (SiO2, Nb3O5) detected 1000 times larger signal than anticipated from direct X-ray absorption. We attributed this effect to X-ray induced generation of secondary particles in the substrate. The enhancement corresponds to an increase in the flux by the factor of 3.6, relative to a state-of-the-art commercial X-ray silicon drift detector. The detector exhibited 8.25 ns temporal recovery time and 82 ps timing resolution, measured using optical photons. Our results emphasize the importance of the substrate in superconducting X-ray single photon detectors.

Place, publisher, year, edition, pages
Institute of Electrical and Electronics Engineers (IEEE), 2021
Keywords
Nanowire single photon detector, niobium titanium nitride, superconducting thin film, X-ray detection
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:kth:diva-295834 (URN)10.1109/TASC.2021.3066578 (DOI)000649704900003 ()2-s2.0-85103192843 (Scopus ID)
Note

QC 20210528

Available from: 2021-05-28 Created: 2021-05-28 Last updated: 2022-06-25Bibliographically approved
Organisations
Identifiers
ORCID iD: ORCID iD iconorcid.org/0000-0002-4394-0591

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