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Process and geometrical integrity optimization of electron beam melting for copper
KTH, School of Industrial Engineering and Management (ITM), Production Engineering, Manufacturing and Metrology Systems.ORCID iD: 0000-0003-4120-4790
KTH, School of Industrial Engineering and Management (ITM), Production Engineering, Manufacturing and Metrology Systems.ORCID iD: 0000-0002-2582-9910
KTH, School of Industrial Engineering and Management (ITM), Production Engineering.
KTH, School of Industrial Engineering and Management (ITM), Production Engineering.ORCID iD: 0000-0003-0199-7909
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2022 (English)In: CIRP annals, ISSN 0007-8506, E-ISSN 1726-0604, Vol. 71, p. 201-204Article in journal (Refereed) Published
Abstract [en]

This work systematically analyzes and optimizes the process of electron beam melting for pure copper. It is shown that, for reliable manufacturing, the preheating temperature should be optimized to avoid porosity as well as part deformation. The electron beam should be fully focused to prevent shrinkage voids (correlated to negative defocusing) and material spattering (linked to positive defocusing). Smoother surfaces from lower hatch spacing (e.g., 100┬Ám) can improve the density reliability, while longer overhangs are reached by a higher hatch spacing. A suitable starting contour strategy is also applied to mitigate border porosities, reduce side roughness and increase geometric precision.

Place, publisher, year, edition, pages
Elsevier BV , 2022. Vol. 71, p. 201-204
Keywords [en]
Additive Manufacturing, Optimization, Electron Beam Melting (EBM)
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:kth:diva-312467DOI: 10.1016/j.cirp.2022.03.041ISI: 000886363500002Scopus ID: 2-s2.0-85129085733OAI: oai:DiVA.org:kth-312467DiVA, id: diva2:1659098
Note

QC 20220530

Available from: 2022-05-18 Created: 2022-05-18 Last updated: 2024-01-17Bibliographically approved

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Publisher's full textScopushttps://www.sciencedirect.com/science/article/pii/S0007850622000488

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Dadbakhsh, SasanZhao, XiaoyuChinnappan, Prithiv KumarShanmugam, VishalZeyu, LinHulme-Smith, Christopher

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Dadbakhsh, SasanZhao, XiaoyuChinnappan, Prithiv KumarShanmugam, VishalZeyu, LinHulme-Smith, Christopher
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