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Surge Current Distribution in Paralleled SiC MOSFETs Under Third-Quadrant Operation
Hefei Univ Technol, Anhui Prov Key Lab Semicond Packaging & Reliabil, Hefei 230009, Peoples R China.
Hefei Univ Technol, Anhui Prov Key Lab Semicond Packaging & Reliabil, Hefei 230009, Peoples R China.
Hefei Univ Technol, Anhui Prov Key Lab Semicond Packaging & Reliabil, Hefei 230009, Peoples R China.
Hefei Univ Technol, Anhui Prov Key Lab Semicond Packaging & Reliabil, Hefei 230009, Peoples R China.
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2025 (English)In: IEEE transactions on power electronics, ISSN 0885-8993, E-ISSN 1941-0107, Vol. 40, no 2, p. 3077-3089Article in journal (Refereed) Published
Abstract [en]

Surge current capability of paralleled silicon carbide (SiC) metal-oxide-semiconductor-field-effect transistors (mosfets) operating in both first and third quadrants is required in various applications. The surge current distribution in paralleled SiC mosfets during third quadrant operation needs further investigations. This article, therefore, establishes a source-drain resistance model of SiC mosfets under different gate bias in surge current range, which reveals the current "competition mechanism" between the MOS-channel path and the body diode path under surge current conditions. It then investigates the influence of device parameters discrepancy on surge current distribution in paralleled SiC mosfets. It finds out that the discrepancy of body diode parameters has significant influences on surge current distribution under different gate biases, while the parameter discrepancy of MOS-channel has much smaller impact on surge current distribution, even with positive gate bias. The conclusions of this article are supported with simulation and experimental results.

Place, publisher, year, edition, pages
Institute of Electrical and Electronics Engineers (IEEE) , 2025. Vol. 40, no 2, p. 3077-3089
Keywords [en]
Paralleled silicon carbide (SiC) metal-oxide-semiconductor-field-effect transistors (MOSFETS), surge current, third quadrant
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-359498DOI: 10.1109/TPEL.2024.3485730ISI: 001378125700025Scopus ID: 2-s2.0-85207383637OAI: oai:DiVA.org:kth-359498DiVA, id: diva2:1934567
Note

QC 20250204

Available from: 2025-02-04 Created: 2025-02-04 Last updated: 2025-02-04Bibliographically approved

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Wang, Xiongfei

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