Ultraviolet (UV) detection is important in astronomy, combustion detections and medical analysis. Solid-state UV detectors based on wide band gap semiconductors, such as 4H-SiC, are widely studied because of their excellent electrical properties [1]. 4H-SiC based UV detectors are solar blind and can be applied in extremely high temperature environments [2]. However, the state-of-art 4H-SiC photodetectors still have large sizes (>10000 μm2), which are not suitable to be integrated into high resolution UV photography sensors. To build a full-frame UV imaging sensor containing megapixels, photodiodes smaller than 20 μm by side are necessary. Here, we report the fabrication and characterization of 4H-SiC p-i-n photodiodes with mesa areas scaled from 40000 μm2 to 400 μm2. The relationships between the parameters and the areas of the photodiodes are discussed. The photodiodes are fully functional from room temperature (RT) to 500 °C.