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Micro-galvanic corrosion of Cu/Ru couple in potassium periodate (KIO4) solution
KTH, Skolan för kemi, bioteknologi och hälsa (CBH), Kemi, Yt- och korrosionsvetenskap. Tsinghua University, Beijing, China.
2018 (engelsk)Inngår i: Corrosion Science, ISSN 0010-938X, E-ISSN 1879-0496, Vol. 137, s. 184-193Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

This paper focuses on the study of micro-galvanic corrosion of the Cu/Ru couple in KIO4 solution. Practical nobility across the Cu/Ru interface was evaluated by Volta potential mapping, and the morphological changes were monitored by in-situ atomic force microscopy measurements during exposure in a KIO4 solution. Chemical composition of precipitated corrosion product was analyzed by Confocal Raman spectroscopy immediately after the exposure. The results show that Cu is the anode of the Cu/Ru couple, and accelerated dissolution of Cu preferentially occurs near the Cu/Ru interface. However, subsequent formation of insoluble Cu(IO3)2·nH2O leads to precipitation, which impedes further Cu corrosion.

sted, utgiver, år, opplag, sider
Elsevier, 2018. Vol. 137, s. 184-193
Emneord [en]
A. Electronic materials, B. AFM, B. EIS, B: Raman spectroscopy, C. Interfaces, C: Oxidation
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Identifikatorer
URN: urn:nbn:se:kth:diva-227561DOI: 10.1016/j.corsci.2018.03.045ISI: 000436213400015Scopus ID: 2-s2.0-85044593921OAI: oai:DiVA.org:kth-227561DiVA, id: diva2:1206512
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QC 20180517

Tilgjengelig fra: 2018-05-17 Laget: 2018-05-17 Sist oppdatert: 2018-12-14bibliografisk kontrollert

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