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Measuring peripheral wavefront aberrations in subjects with large central visual field loss
KTH, Skolan för teknikvetenskap (SCI), Tillämpad fysik, Biomedicinsk fysik och röntgenfysik.ORCID-id: 0000-0002-4894-7944
KTH, Tidigare Institutioner (före 2005), Fysik. KTH, Skolan för teknikvetenskap (SCI), Tillämpad fysik, Biomedicinsk fysik och röntgenfysik.ORCID-id: 0000-0001-9172-858X
2004 (engelsk)Inngår i: OPHTHALMIC TECHNOLOGIES XIV / [ed] Manns, F; Soderberg, PG; Ho, A, BELLINGHAM: SPIE-INT SOC OPTICAL ENGINEERING , 2004, Vol. 5314, s. 209-219Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

In a previous study we have shown that correction of peripheral refractive errors can improve the remaining vision in the preferred retinal location (PRL) of subjects with large central visual field loss (CFL). Measuring peripheral refractive errors with traditional methods is often difficult due to the low visual acuity and large aberrations. Therefore a Hartmann-Shack (HS) sensor has been designed to measure peripheral wavefront aberrations in CFL subjects. Method: The HS sensor incorporates an eyetracker and analyzing software designed to handle large wavefront aberrations. To ensure that the measurement axis is aligned with the subject's PRL, a special fixation target has been developed. It consists of concentric rings surrounding the aperture of the HS together with a central fixation mark along the measurement axis. Results: Some initial measurements on subjects with CFL have been performed successfully. As a first step in improving the peripheral optics of the eye, the wavefront data have been used to calculate the subject's optimal eccentric refraction. Conclusion: Measuring the wavefront aberrations is a fast and easy way to assess the details of the optics in subjects with CFL. The wavefront data can then be used to better understand the problems of eccentric correction.

sted, utgiver, år, opplag, sider
BELLINGHAM: SPIE-INT SOC OPTICAL ENGINEERING , 2004. Vol. 5314, s. 209-219
Serie
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), ISSN 0277-786X ; 5314
Emneord [en]
peripheral, wavefront aberrations, Hartmann-Shack sensor, central visual field loss, preferred retinal location, eccentric refraction, unwrapping, Zernike polynomials, root mean square (RMS), Strehl ratio
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-43932DOI: 10.1117/12.540885ISI: 000223299200028Scopus ID: 2-s2.0-12144252462ISBN: 0-8194-5222-X (tryckt)OAI: oai:DiVA.org:kth-43932DiVA, id: diva2:451273
Konferanse
14th Conference on Ophthalmic Technologies Location: San Jose, CA. JAN 24-27, 2004. SPIE
Merknad

QC 20111025

Tilgjengelig fra: 2011-10-25 Laget: 2011-10-19 Sist oppdatert: 2022-06-24bibliografisk kontrollert

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