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High resolution full-field imaging of nanostructures using compact extreme ultraviolet lasers
NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University.
Vise andre og tillknytning
2009 (engelsk)Inngår i: 9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY / [ed] David, C; Nolting, F; Quitmann, C; Stampanoni, M; Pfeiffer, F, 2009, Vol. 186Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

Recent advances in the development of high peak brightness table-top extreme ultraviolet (EUV) and soft x-ray (SRX) lasers have opened new opportunities for the demonstration of compact full-field EUV/SXR microscopes capable of capturing images with short exposures down to a single laser shot. We demonstrate the practical application of table-top zone plate EUV microscopes that can image nanostructures with a spatial resolution of 54 nm and below and exposure times as short as 1.2 ns, the duration of a single laser shot.

sted, utgiver, år, opplag, sider
2009. Vol. 186
Serie
Journal of Physics Conference Series, ISSN 1742-6588 ; 186
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-86185DOI: 10.1088/1742-6596/186/1/012026ISI: 000282023900026OAI: oai:DiVA.org:kth-86185DiVA, id: diva2:500500
Konferanse
9th International Conference on X-Ray Microscopy. ETH, Zurich, SWITZERLAND. JUL 21-25, 2008
Merknad
QC 20120220Tilgjengelig fra: 2012-02-13 Laget: 2012-02-13 Sist oppdatert: 2012-02-20bibliografisk kontrollert

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