Endre søk
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Development of a state-of-the-art nm-measurement system for square meter sized lithography masks
KTH, Skolan för industriell teknik och management (ITM), Industriell produktion, Mätteknik och optik.
2012 (engelsk)Inngår i: Proceedings of the 12th euspen International Conference 2012, 2012, s. 57-62Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

The demands and solutions for ultra-precision metrology in the manufacturing of lithography masks for the display industry are indeed challenging. Specification demands to be overcome are a measurement repeatability of 10 nm (3 σ) and an absolute accuracy of better than 100 nm (3 σ) on a scale of more than 1.5 m in the X and Y directions. The design of a measurement system that meets these requirements calls for careful selections of materials such as metal, ceramic composites, quartz or glass as they at this precision level are highly affected by the surrounding temperature. Also the fact that the refractive index of air in the interferometers measuring absolute distances is affected by temperature, pressure, humidity and CO2 content make the reference measurements really challenging [1].

As in many other areas in the industry high quality metrology is the key for success in developing high accuracy production tools. This paper will therefore start by introducing the metrology requirements of mask making for display screens and end with the state-of-the-art results we have achieved.

sted, utgiver, år, opplag, sider
2012. s. 57-62
HSV kategori
Forskningsprogram
SRA - Produktion
Identifikatorer
URN: urn:nbn:se:kth:diva-116465Scopus ID: 2-s2.0-84911390091OAI: oai:DiVA.org:kth-116465DiVA, id: diva2:589693
Konferanse
The 12th euspen International Conference 2012
Forskningsfinansiär
XPRES - Initiative for excellence in production research
Merknad

QC 20130522

Tilgjengelig fra: 2013-01-18 Laget: 2013-01-18 Sist oppdatert: 2013-05-22bibliografisk kontrollert

Open Access i DiVA

Fulltekst mangler i DiVA

Scopus

Søk i DiVA

Av forfatter/redaktør
Ekberg, Peter
Av organisasjonen

Søk utenfor DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric

urn-nbn
Totalt: 211 treff
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf