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Gray scale E-beam lithography to fabricate 3D microsized waveguide and grating coupler in SU-8
KTH, Skolan för informations- och kommunikationsteknik (ICT).
KTH, Skolan för informations- och kommunikationsteknik (ICT).
KTH, Skolan för informations- och kommunikationsteknik (ICT).
KTH, Skolan för informations- och kommunikationsteknik (ICT). Aalto University, Finland.
2010 (engelsk)Inngår i: Frontiers in Optics, 2010Konferansepaper, Publicerat paper (Fagfellevurdert)
Abstract [en]

Gray scale electron beam lithography is applied to prototype 3D waveguides and grating output couplers in SU-8 with simple and accurate method. The lag effect in reactive ion etching of Silicon-on-insulator gratings is avoided here.

sted, utgiver, år, opplag, sider
2010.
Serie
Optics InfoBase Conference Papers, ISSN 2162-2701
Emneord [en]
e-Beam lithography, Grating couplers, Gray scale, Gray scale electron beam lithographies, Lag effects, Output couplers
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-165016Scopus ID: 2-s2.0-84896776444OAI: oai:DiVA.org:kth-165016DiVA, id: diva2:807262
Konferanse
Laser Science, LS 2010, Rochester, NY, United States, 24 October 2010 through 28 October 2010
Merknad

QC 20150423

Tilgjengelig fra: 2015-04-23 Laget: 2015-04-21 Sist oppdatert: 2015-04-23bibliografisk kontrollert

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