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On reactive high power impulse magnetron sputtering
KTH, Skolan för elektro- och systemteknik (EES), Rymd- och plasmafysik. University of Iceland, Iceland.ORCID-id: 0000-0002-8153-3209
2015 (engelsk)Inngår i: Plasma Physics and Controlled Fusion, ISSN 0741-3335, E-ISSN 1361-6587, Vol. 58, nr 1Artikkel i tidsskrift (Fagfellevurdert) Published
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Abstract [en]

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition (IPVD) technique that is particularly promising for reactive sputtering applications. However, there are few issues that have to be resolved before the full potential of this technique can be realized. Here we give an overview of the key experimental findings for the reactive HiPIMS discharge. An increase in the discharge current is commonly observed with increased partial pressure of the reactive gas or decreased repetition pulse frequency. There are somewhat conflicting claims regarding the hysteresis effect in the reactive HiPIMS discharge as some report reduction or elimination of the hysteresis effect while others claim a feedback control is essential. The ion energy distribution of the metal ion and the atomic ion of the reactive gas are similar and extend to very high energies while the ion energy distribution of the working gas and the molecular ion of the reactive gas are similar and are much less energetic.

sted, utgiver, år, opplag, sider
Institute of Physics Publishing (IOPP), 2015. Vol. 58, nr 1
Emneord [en]
high power impulse magnetron sputtering (HiPIMS), magnetron sputtering, oxidation, reactive sputtering
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-181982DOI: 10.1088/0741-3335/58/1/014002ISI: 000368471900003Scopus ID: 2-s2.0-84949658065OAI: oai:DiVA.org:kth-181982DiVA, id: diva2:903175
Forskningsfinansiär
VINNOVA, 2014-04876
Merknad

QC 20160215

Tilgjengelig fra: 2016-02-15 Laget: 2016-02-11 Sist oppdatert: 2017-11-30bibliografisk kontrollert

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