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CMOS compatible ALD high-k double slot grating couplers for on-chip optical interconnects
KTH, Skolan för informations- och kommunikationsteknik (ICT), Integrerade komponenter och kretsar.
KTH, Skolan för informations- och kommunikationsteknik (ICT), Integrerade komponenter och kretsar.
KTH, Skolan för informations- och kommunikationsteknik (ICT), Integrerade komponenter och kretsar.ORCID-id: 0000-0001-6459-749X
KTH, Skolan för informations- och kommunikationsteknik (ICT), Integrerade komponenter och kretsar.ORCID-id: 0000-0002-5845-3032
2012 (Engelska)Ingår i: Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European, IEEE , 2012, s. 93-96Konferensbidrag, Publicerat paper (Refereegranskat)
Abstract [en]

Silicon-on-insulator(SOI) novel on-chip grating couplers for double slot high-k waveguides are experimentally demonstrated. The devices were fabricated with standard CMOS process technology. The grating couplers were designed for the best performance at the C-band communication range. Two thin layers of aluminum oxide formed the slot region of the waveguide. The high-k layers were deposited using the atomic layer deposition (ALD) method. A reliable process was realized by etching the structures to the buried oxide. Effect of the top oxide cladding layer on the efficiency was studied. The grating couplers had a measured efficiency of 22% at 1.55μm wavelength. This efficiency is competitive to other results reported by other groups.

Ort, förlag, år, upplaga, sidor
IEEE , 2012. s. 93-96
Serie
European Solid-State Device Research Conference, ISSN 1930-8876
Nyckelord [en]
Aluminum oxides, Buried oxides, Cladding layer, CMOS Compatible, Communication range, Grating couplers, On chips, On-chip optical interconnects, Silicon-on-insulators, Standard CMOS process, Thin layers
Nationell ämneskategori
Elektroteknik och elektronik
Identifikatorer
URN: urn:nbn:se:kth:diva-111803DOI: 10.1109/ESSDERC.2012.6343341Scopus ID: 2-s2.0-84870591044ISBN: 978-146731707-8 (tryckt)OAI: oai:DiVA.org:kth-111803DiVA, id: diva2:587416
Konferens
42nd European Solid-State Device Research Conference, ESSDERC 2012, 17 September 2012 through 21 September 2012, Bordeaux
Forskningsfinansiär
StandUp
Anmärkning

QC 20130114

Tillgänglig från: 2013-01-14 Skapad: 2013-01-14 Senast uppdaterad: 2014-11-14Bibliografiskt granskad
Ingår i avhandling
1. Horizontal Slot Waveguides for Silicon Photonics Back-End Integration
Öppna denna publikation i ny flik eller fönster >>Horizontal Slot Waveguides for Silicon Photonics Back-End Integration
2014 (Engelska)Doktorsavhandling, sammanläggning (Övrigt vetenskapligt)
Abstract [en]

This thesis presents the development of integrated silicon photonic devices. These devices are compatible with the present and near future CMOS technology. High-khorizontal grating couplers and waveguides are proposed. This work consists of simulations and device design, as well as the layout for the fabrication process, device fabrication, process development, characterization instrument development and electro-optical characterizations.

The work demonstrates an alternative solution to costly silicon-on-insulator photonics. The proposed solution uses bulk silicon wafers and thin film deposited waveguides. Back-end deposited horizontal slot grating couplers and waveguides are realized by multi-layers of amorphous silicon and high-k materials.

The achievements of this work include: A theoretical study of fully etched slot grating couplers with Al2O3, HfO2 and AIN, an optical study of the high-k films with spectroscopic ellipsometry, an experimental demonstration of fully etched SiO2 single slot grating couplers and double slot Al2O3 grating couplers, a practical demonstration of horizontal double slot high-k waveguides, partially etched Al2O3 single slot grating couplers, a study of a scheme for integration of the double slot Al2O3  waveguides with selectively grown germanium PIN photodetectors, realization of test chips for the integrated germanium photodetectors, and study of integration with graphene photodetectors through embedding the graphene into a high-k slot layer.

From an application point of view, these high-k slot waveguides add more functionality to the current silicon photonics. The presented devices can be used for low cost photonics applications. Also alternative optical materials can be used in the context of this photonics platform.

With the robust design, the grating couplers result in improved yield and a more cost effective solution is realized for integration of the waveguides with the germanium and graphene photodetectors.

 

 

 

 

Ort, förlag, år, upplaga, sidor
Stockholm: KTH Royal Institute of Technology, 2014. s. xiii, 90
Serie
TRITA-ICT/MAP AVH, ISSN 1653-7610 ; 2014:17
Nyckelord
silicon photonics, slot waveguides, grating couplers, CMOS tech- nology, high-k, ALD, germanium photodetectors, graphene photodetectors, pho- tonic integrated circuits
Nationell ämneskategori
Nanoteknik Annan elektroteknik och elektronik
Identifikatorer
urn:nbn:se:kth:diva-155732 (URN)978-91-7595-340-3 (ISBN)
Disputation
2014-12-05, Sal/hall A, Electrum, KTH-ICT, Kista, 10:00 (Engelska)
Opponent
Handledare
Anmärkning

QC 20141114

Tillgänglig från: 2014-11-14 Skapad: 2014-11-11 Senast uppdaterad: 2016-12-01Bibliografiskt granskad

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Malm, Gunnar B.

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Naiini, Maziar M.Henkel, ChristophMalm, Gunnar B.Östling, Mikael
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