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Nano-fabrication of condenser and micro zone plates for compact X-ray microscopy
KTH, Tidigare Institutioner, Fysik.ORCID-id: 0000-0003-2745-6289
KTH, Tidigare Institutioner, Fysik.
KTH, Tidigare Institutioner, Fysik.ORCID-id: 0000-0003-2723-6622
2004 (engelsk)Inngår i: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 73/74, s. 639-643Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

We demonstrate nano-fabrication of high-aspect ratio and high-spatial frequency diffractive X-ray optics with high uniformity for use in a laser-plasma-based compact water-window X-ray microscope. The structures are fabricated on 50 nm thin Si3N4-membranes using a three-layer resist scheme and 30 keV e-beam lithography in combination with reactive ion etching and nickel electroplating. The process is developed on solely commercially available resists and instruments. As examples, we demonstrate fabrication of micro-zone plates with outermost linewidths of 30 nm and an uniform zone height of 160 nm, and a 4.5 mm diameter condenser zone plate with 50-60 nm lines, fabricated by using stitched fields.

sted, utgiver, år, opplag, sider
2004. Vol. 73/74, s. 639-643
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-5982DOI: 10.1016/j.mee.2004.03.006ISI: 000222145400113Scopus ID: 2-s2.0-2542479378OAI: oai:DiVA.org:kth-5982DiVA, id: diva2:10538
Merknad
QC 20100616, QC 20111017. 29th International Conference on Micro and Nano Engineering (MNE 2003), Cambridge, ENGLAND, SEP 22-25, 2003 Tilgjengelig fra: 2006-06-08 Laget: 2006-06-08 Sist oppdatert: 2020-01-30bibliografisk kontrollert
Inngår i avhandling
1. Nanofabrication of Zone Plate Optics for Compact Soft X-Ray Microscopy
Åpne denne publikasjonen i ny fane eller vindu >>Nanofabrication of Zone Plate Optics for Compact Soft X-Ray Microscopy
2006 (engelsk)Doktoravhandling, med artikler (Annet vitenskapelig)
Abstract [en]

This Thesis describes the development of the KTH/Stockholm nanofabrication process for diffractive soft x-ray optics. The effort is motivated by the need for and requirement of specially designed diffractive optics and test objects for compact x-ray microscopy as well as optics for other applications such as phase imaging. The optics have been fabricated in-house, in the KTH Nanofabrication Laboratory.

The nanofabrication process is based on electron-beam lithography in combination with reactive ion etching (RIE) and nickel electroplating. This process has successfully been used for the fabrication of micro zone plates, condenser zone plates, diffractive optical elements for differential-interference microscopy, and different test structures. Optics with electroplated feature sizes down to 25 nm have been fabricated with high aspect-ratios. Special consideration has been given the reproducibility and optimization of the process parameters. This is essential for improving the yield and quality of the fabricated optics. The work includes, e.g., improved e-beam writing strategies and controlled electroplating. Furthermore, a high diffraction efficiency is necessary for our applications, which are based on compact low-power sources. This requires the fabrication of optics with a high and uniform aspect ratio. For this purpose the electroplating process step has been improved with an in-situ light-transmission-based thickness control method for optimum mold filling, and pulse and pulse-reverse techniques for uniform plating.

sted, utgiver, år, opplag, sider
Stockholm: KTH, 2006
Serie
Trita-FYS, ISSN 0280-316X ; 2006:41
HSV kategori
Identifikatorer
urn:nbn:se:kth:diva-4045 (URN)91-7178-390-3 (ISBN)
Disputas
2006-06-16, Sal FD5, AlbaNova univ centrum, Roslagstullsbacken 21, Stockholm, 10:00
Opponent
Veileder
Merknad
QC 20100616Tilgjengelig fra: 2006-06-08 Laget: 2006-06-08 Sist oppdatert: 2020-01-30bibliografisk kontrollert

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