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Nickel Zone Plates for Compact Soft X-Ray Microscopy
KTH, Skolan för teknikvetenskap (SCI), Tillämpad fysik.ORCID-id: 0000-0003-2745-6289
2006 (engelsk)Inngår i: Proc. 8th Internat. Conference on X-Ray Microscopy, 2006Konferansepaper, Publicerat paper (Annet vitenskapelig)
sted, utgiver, år, opplag, sider
2006.
Serie
IPAP Conference Series ; 7
HSV kategori
Identifikatorer
URN: urn:nbn:se:kth:diva-5985OAI: oai:DiVA.org:kth-5985DiVA, id: diva2:10541
Konferanse
8th Internat. Conference on X-Ray Microscopy
Merknad
QC 20100616Tilgjengelig fra: 2006-06-08 Laget: 2006-06-08 Sist oppdatert: 2010-06-16bibliografisk kontrollert
Inngår i avhandling
1. Nanofabrication of Zone Plate Optics for Compact Soft X-Ray Microscopy
Åpne denne publikasjonen i ny fane eller vindu >>Nanofabrication of Zone Plate Optics for Compact Soft X-Ray Microscopy
2006 (engelsk)Doktoravhandling, med artikler (Annet vitenskapelig)
Abstract [en]

This Thesis describes the development of the KTH/Stockholm nanofabrication process for diffractive soft x-ray optics. The effort is motivated by the need for and requirement of specially designed diffractive optics and test objects for compact x-ray microscopy as well as optics for other applications such as phase imaging. The optics have been fabricated in-house, in the KTH Nanofabrication Laboratory.

The nanofabrication process is based on electron-beam lithography in combination with reactive ion etching (RIE) and nickel electroplating. This process has successfully been used for the fabrication of micro zone plates, condenser zone plates, diffractive optical elements for differential-interference microscopy, and different test structures. Optics with electroplated feature sizes down to 25 nm have been fabricated with high aspect-ratios. Special consideration has been given the reproducibility and optimization of the process parameters. This is essential for improving the yield and quality of the fabricated optics. The work includes, e.g., improved e-beam writing strategies and controlled electroplating. Furthermore, a high diffraction efficiency is necessary for our applications, which are based on compact low-power sources. This requires the fabrication of optics with a high and uniform aspect ratio. For this purpose the electroplating process step has been improved with an in-situ light-transmission-based thickness control method for optimum mold filling, and pulse and pulse-reverse techniques for uniform plating.

sted, utgiver, år, opplag, sider
Stockholm: KTH, 2006
Serie
Trita-FYS, ISSN 0280-316X ; 2006:41
HSV kategori
Identifikatorer
urn:nbn:se:kth:diva-4045 (URN)91-7178-390-3 (ISBN)
Disputas
2006-06-16, Sal FD5, AlbaNova univ centrum, Roslagstullsbacken 21, Stockholm, 10:00
Opponent
Veileder
Merknad
QC 20100616Tilgjengelig fra: 2006-06-08 Laget: 2006-06-08 Sist oppdatert: 2010-06-16bibliografisk kontrollert

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