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Copper Oxide Film In-situ Electrodeposited from Cu(II) Complex as Highly Efficient Catalyst for Water Oxidation
Vise andre og tillknytning
2017 (engelsk)Inngår i: Electrochimica Acta, ISSN 0013-4686, E-ISSN 1873-3859, Vol. 230, s. 501-507Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Water splitting is deemed as an effective pathway for producing ideal clean energy, such as hydrogen. Here, a copper oxide film (Cu-Tris film) was prepared in-situ from a 0.2 M phosphate buffer solution (pH = 12.0) containing 1.0 mM Cu2+ and 2.0 mM Tris via controlled-potential electrodeposition. The Cu-Tris film showed a significantly low overpotential of 390 mV at a current density of 1.0 mA/cm2 for electrocatalytic water oxidation. Simultaneously, a considerably low Tafel slope of 41 mV/decade was achieved. This Cu-Tris film also exhibited a high and stable current density of ca. 7.5 mA/cm2 at 1.15 V vs. NHE for long-term electrocatalysis (10 h). These results demonstrated the superior performance of the developed Cu-Tris film, which should be attributed to the regulating effect of the five coordinated planar structure of the Cu-Tris complex precursor during the process of electrodeposition.

sted, utgiver, år, opplag, sider
Elsevier, 2017. Vol. 230, s. 501-507
Emneord [en]
Copper based film, Electrocatalyst, Electrodeposition, Water oxidation, Coordination reactions, Copper compounds, Copper oxides, Electrocatalysis, Electrocatalysts, Electrodes, Oxidation, Oxide films, Copper-based, Efficient catalysts, Electrocatalytic, Five-coordinated, Phosphate buffer solutions, Planar structure, Water splitting, Copper
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Identifikatorer
URN: urn:nbn:se:kth:diva-208021DOI: 10.1016/j.electacta.2017.01.187ISI: 000395599900057Scopus ID: 2-s2.0-85012297950OAI: oai:DiVA.org:kth-208021DiVA, id: diva2:1106239
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QC 20170607

Tilgjengelig fra: 2017-06-07 Laget: 2017-06-07 Sist oppdatert: 2017-11-10bibliografisk kontrollert

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