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Metasurfaces: Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016).
2016 (engelsk)Inngår i: Advanced Materials, ISSN 0935-9648, E-ISSN 1521-4095, Vol. 28, nr 23Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.

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2016. Vol. 28, nr 23
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URN: urn:nbn:se:kth:diva-197573DOI: 10.1002/adma.201670163PubMedID: 27281049OAI: oai:DiVA.org:kth-197573DiVA, id: diva2:1165988
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QC 20171214

Tilgjengelig fra: 2017-12-14 Laget: 2017-12-14 Sist oppdatert: 2017-12-14bibliografisk kontrollert

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