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Characterization of surface films that develop on pre-oxidized copper in anoxic simulated groundwater with sulphide
VTT Technical Research Centre of Finland Ltd, Espoo, Finland.
VTT Technical Research Centre of Finland Ltd, Espoo, Finland.
KTH, School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Chemistry, Surface and Corrosion Science.ORCID iD: 0000-0002-6218-2108
Department of Chemistry and Chemical Engineering, Chalmers University of Technology, Gothenburg, Sweden.
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2023 (English)In: Colloids and Surfaces A: Physicochemical and Engineering Aspects, ISSN 0927-7757, E-ISSN 1873-4359, Vol. 676, article id 132214Article in journal (Refereed) Published
Abstract [en]

Surface films formed on pre-oxidized copper in anoxic simulated groundwater with sulphide were characterized by field emission gun scanning electron microscopy (FEG-SEM), Fourier transform infrared spectroscopy (FT-IR), open circuit potential (OCP) measurements, and via analysing the water chemistry and weight changes in the specimens. Additionally, films developed under identical conditions on pre-oxidized and ground copper specimens were characterized by glow discharge optical emission spectroscopy (GDOES). The results revealed that the sulphide content in the groundwater significantly influences the morphology, composition and thickness of the surface film. The build-up of Cu2S was evidenced at the sulphide contents of 32 mg/L and 320 mg/L. GDOES depth profiling revealed that sulphur and oxygen coexisted in the film all through its thickness, yet the surface was essentially rich in sulphur. The results from characterization are presented in detail in this paper and discussed from the perspective of capabilities of the used methods.

Place, publisher, year, edition, pages
Elsevier BV , 2023. Vol. 676, article id 132214
Keywords [en]
Copper, Copper sulphide, Cuprous oxide, Surface film, Thickness
National Category
Corrosion Engineering
Identifiers
URN: urn:nbn:se:kth:diva-334957DOI: 10.1016/j.colsurfa.2023.132214ISI: 001073107900001Scopus ID: 2-s2.0-85167968531OAI: oai:DiVA.org:kth-334957DiVA, id: diva2:1792624
Note

QC 20230830

Available from: 2023-08-30 Created: 2023-08-30 Last updated: 2023-10-16Bibliographically approved

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Yue, XiaoqiLeygraf, ChristopherPan, Jinshan

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Colloids and Surfaces A: Physicochemical and Engineering Aspects
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