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Ion beam analysis of sputter-deposited gold films for quartz resonators
KTH, Tidigare Institutioner (före 2005), Alfvénlaboratoriet.
2000 (engelsk)Inngår i: Surface and Interface Analysis, ISSN 0142-2421, E-ISSN 1096-9918, Vol. 30, nr 1, s. 620-622Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Sputter deposition using a focused ion beam has been investigated as an alternative to magnetron sputtering for the deposition of thin-film gold electrodes onto quartz resonators. One potential concern is the inclusion of argon in the growing film when argon ions are used for sputtering. Argon retention in sputter-deposited gold films using an 11.5 keV argon ion beam was investigated with Rutherford backscattering spectrometry and it was found that in layers deposited at close to normal ejection angles the argon trapping was at the level of less than or equal to 1 at,%, similar to magnetron-deposited layers, whereas argon incorporation increased with the ejection angle up to several per cent at large angles.

sted, utgiver, år, opplag, sider
2000. Vol. 30, nr 1, s. 620-622
Emneord [en]
sputter deposition, ion beam, gold, stress
Identifikatorer
URN: urn:nbn:se:kth:diva-20027DOI: 10.1002/1096-9918(200008)30:1<620::AID-SIA838>3.0.CO;2-4ISI: 000089238400134Scopus ID: 2-s2.0-17544393001OAI: oai:DiVA.org:kth-20027DiVA, id: diva2:338720
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QC 20100525

Tilgjengelig fra: 2010-08-10 Laget: 2010-08-10 Sist oppdatert: 2019-11-13bibliografisk kontrollert

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