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Iodine reaction and passivation of the Ge(111) surface
Vise andre og tillknytning
1997 (engelsk)Inngår i: Surface Science, ISSN 0039-6028, E-ISSN 1879-2758, Vol. 371, nr 2-3, s. 264-276Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The Ge(111)-I surface has been studied at different I coverages ranging from 0.05 hit up to saturation, and different annealing temperatures, using photoelectron spectroscopy (PES) and scanning tunneling microscopy (STM). At saturation the surface is covered with I in the top site and Gel, species in the bridge site, coexisting with small islands/clusters comprising GeI2, giving a total coverage of I in GeIx species of 1.15 ML. The chemically induced shifts in the Ge 3d core level are 0.39 eV per attached I atom. The coverage determined from the I 4d core level is higher than 1.15 ML, which we explain by the presence of I not bound to Ge. Annealing at 200 degrees C decreases the iodine coverage, whereas the I 4d and Ge 3d line profiles are practically unchanged. Further heating desorbs the iodide species and restores the virgin c(2 x 8) structure.

sted, utgiver, år, opplag, sider
1997. Vol. 371, nr 2-3, s. 264-276
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URN: urn:nbn:se:kth:diva-84443DOI: 10.1016/S0039-6028(96)01094-1ISI: A1997WE53100010Scopus ID: 2-s2.0-0031076656OAI: oai:DiVA.org:kth-84443DiVA, id: diva2:499392
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NR 20140805Tilgjengelig fra: 2012-02-13 Laget: 2012-02-13 Sist oppdatert: 2020-03-10bibliografisk kontrollert

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