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High aspect ratio etching and characterization of 2D-photonic crystals in InP/InGaAsP/InP heterostructures
KTH, Tidigare Institutioner, Mikroelektronik och informationsteknik, IMIT.
KTH, Tidigare Institutioner, Mikroelektronik och informationsteknik, IMIT.
KTH, Tidigare Institutioner, Mikroelektronik och informationsteknik, IMIT.
KTH, Tidigare Institutioner, Mikroelektronik och informationsteknik, IMIT.ORCID-id: 0000-0003-2136-4914
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2004 (Engelska)Ingår i: Photonics: Design, Technology, And Packaging / [ed] Jagadish, C; Choquette, KD; Eggleton, BJ; Nener, BD; Nugent, KA, SPIE - International Society for Optical Engineering, 2004, s. 78-89Konferensbidrag, Publicerat paper (Refereegranskat)
Abstract [en]

We report on the fabrication and characterization of 2D photonic crystals (PhCs) in InP/InGaAsP/InP heterostructures. It is demonstrated that Ar/C12 based chemically assisted ion beam etching (CAIBE) is a very promising method to obtain high aspect ratio etching of PhCs in the InP-based materials. With this process, it is possible to obtain PC-holes as deep as 3 microns even for feature (PhC-hole) sizes as small as 200-250 nm. The optical characteristics of the fabricated PhC-based elements/devices such as line-defect waveguides, in-plane resonant cavities and drop-filter based on contra-directional coupling will be reported. The devices were measured using end-fire coupling and the obtained results were simulated using the 2D finite difference time domain (FDTD) method including an effective loss-approximation. The etched PhC-waveguides show low transmission losses, less than 1 dB/100 mum. A quality factor of 400 for a 6 micron long cavity with 6-hole mirrors is obtained. Finally, drop-functionality in a PhC-based filter using contra-directional coupling is demonstrated.

Ort, förlag, år, upplaga, sidor
SPIE - International Society for Optical Engineering, 2004. s. 78-89
Serie
Proceedings of SPIE - International Society for Optical Engineering, ISSN 0277-786X ; 5277
Nyckelord [en]
photonic crystals, photonic crystal waveguides, optical cavities, optical filters, drop filters, InP, chemically assisted ion beam etching, reactive ion beam etching
Nationell ämneskategori
Elektroteknik och elektronik
Identifikatorer
URN: urn:nbn:se:kth:diva-101977DOI: 10.1117/12.525050ISI: 000221639500013Scopus ID: 2-s2.0-2442541070ISBN: 0-8194-5170-3 (tryckt)OAI: oai:DiVA.org:kth-101977DiVA, id: diva2:550507
Konferens
Conference on Photonics - Design, Technology and Packaging, December 10-12, 2003, Perth, Australia
Anmärkning

QC 20120907

Tillgänglig från: 2012-09-07 Skapad: 2012-09-06 Senast uppdaterad: 2012-09-07Bibliografiskt granskad

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Swillo, Marcin

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Anand, SrinivasanQiu, MinMulot, MikaelSwillo, MarcinJaskorzynska, BozenaKarlsson, Anders
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Mikroelektronik och informationsteknik, IMIT
Elektroteknik och elektronik

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