Micromachined Millimeter-Wave Planar Silicon Lens Antennas with Concentric and Shifted Matching Regions
2016 (English)In: IET Microwaves, Antennas & Propagation, ISSN 1751-8725, E-ISSN 1751-8733Article in journal (Other academic) Submitted
This paper presents a study of planar extended hemispherical lens antennas, fabricated from a high-resistivity silicon substrate. The high-permittivity lenses are matched to free-space using up to three stepped impedance matching regions. The effective permittivity of the matching regions is tailor-made by etching periodic holes in the silicon wafer. The optimal thickness and permittivity of the matching regions was determined using TRF optimization, in order to yield the maximum wide-band aperture efficiency and smallest side-lobes. We introduce a new geometry for the matching regions, here referred to as shifted-type matching regions. The simulation results presented here indicate that using three shifted-type matching regions results in twice as large aperture efficiency as compared to using three conventional concentric-type matching regions. A prototype antenna with a single matching region was fabricated and measured in the W-band. By increasing the number of matching regions from one to three, the band-averaged gain is increased by 0.3 dB when using concentric matching regions, and by 3.7 dB when using shifted matching regions, which illustrates the advantage of the new shifted-type matching region.
Place, publisher, year, edition, pages
Institution of Engineering and Technology, 2016.
LENS ANTENNAS, MICROMACHINING, SILICON, ANTENNA DESIGN, IMPEDANCE MATCHING, OPTIMISATION
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-197335OAI: oai:DiVA.org:kth-197335DiVA: diva2:1051803
QC 201611152016-12-032016-12-032016-12-15Bibliographically approved