Nano-fabrication of condenser and micro zone plates for compact X-ray microscopy
2004 (English)In: Microelectronic Engineering, ISSN 0167-9317, Vol. 73/74, 639-643 p.Article in journal (Refereed) Published
We demonstrate nano-fabrication of high-aspect ratio and high-spatial frequency diffractive X-ray optics with high uniformity for use in a laser-plasma-based compact water-window X-ray microscope. The structures are fabricated on 50 nm thin Si3N4-membranes using a three-layer resist scheme and 30 keV e-beam lithography in combination with reactive ion etching and nickel electroplating. The process is developed on solely commercially available resists and instruments. As examples, we demonstrate fabrication of micro-zone plates with outermost linewidths of 30 nm and an uniform zone height of 160 nm, and a 4.5 mm diameter condenser zone plate with 50-60 nm lines, fabricated by using stitched fields.
Place, publisher, year, edition, pages
2004. Vol. 73/74, 639-643 p.
IdentifiersURN: urn:nbn:se:kth:diva-5982DOI: 10.1016/j.mee.2004.03.006ISI: 000222145400113ScopusID: 2-s2.0-2542479378OAI: oai:DiVA.org:kth-5982DiVA: diva2:10538
QC 20100616, QC 20111017. 29th International Conference on Micro and Nano Engineering (MNE 2003), Cambridge, ENGLAND, SEP 22-25, 2003 2006-06-082006-06-082011-10-18Bibliographically approved