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The role of Ohmic heating in dc magnetron sputtering
KTH, School of Electrical Engineering (EES), Space and Plasma Physics. Linköping University, Sweden; Université Paris-Sud, France.
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.ORCID iD: 0000-0002-8153-3209
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2016 (English)In: Plasma sources science & technology (Print), ISSN 0963-0252, E-ISSN 1361-6595, Vol. 25, no 6, 065024Article in journal (Refereed) Published
Abstract [en]

Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The secondary electron emission yield gamma(SE) is identified as the key parameter determining the relative importance of the two processes. For a conventional 5 cm diameter planar dc magnetron, Ohmic heating is found to be more important than sheath energization for secondary electron emission yields below around 0.1.

Place, publisher, year, edition, pages
Institute of Physics Publishing (IOPP), 2016. Vol. 25, no 6, 065024
Keyword [en]
magnetron sputtering, Ohmic heating, energy balance
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-198877DOI: 10.1088/0963-0252/25/6/065024ISI: 000388704100001ScopusID: 2-s2.0-85003811012OAI: oai:DiVA.org:kth-198877DiVA: diva2:1061393
Funder
Swedish Research Council, 621-2014-4882VINNOVA, 2014-04876
Note

QC 20170102

Available from: 2017-01-02 Created: 2016-12-22 Last updated: 2017-01-02Bibliographically approved

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