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Fabrication and characterization of high-K dielectric integrated silicon nanowire sensor for DNA sensing application
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.ORCID iD: 0000-0001-9690-2292
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.ORCID iD: 0000-0001-6705-1660
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2016 (English)In: BIOSENSING AND NANOMEDICINE IX, SPIE - International Society for Optical Engineering, 2016, article id UNSP 99300QConference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
SPIE - International Society for Optical Engineering, 2016. article id UNSP 99300Q
Series
Proceedings of SPIE, ISSN 0277-786X ; 9930
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-200045DOI: 10.1117/12.2237350ISI: 000389681300018ISBN: 978-1-5106-0251-9 (print)ISBN: 978-1-5106-0252-6 (print)OAI: oai:DiVA.org:kth-200045DiVA, id: diva2:1068758
Conference
Conference on Biosensing and Nanomedicine IX, AUG 28-31, 2016, San Diego, CA
Note

QC 20170126

Available from: 2017-01-26 Created: 2017-01-20 Last updated: 2017-01-26Bibliographically approved

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Jayakumar, GaneshHellström, Per-ErikÖstling, Mikael

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