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Processing of ultra-hard coatings based on AlMgB14 films
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.ORCID iD: 0000-0002-4997-9032
2016 (English)In: Journal of Physics, Conference Series, ISSN 1742-6588, E-ISSN 1742-6596, Vol. 769, no 1, 012039Article in journal (Refereed) Published
Abstract [en]

First time AlMgB14 films were prepared in Ames Lab by pulsed laser deposition technique. In this work, RF magnetron sputtering from a single stoichiometric target was employed to fabricate hard AlMgB14 coatings on Si wafer and industrial items. Measurements of nanohardness and elastic Young's modulus were performed to determine reliable strength characteristics of samples. Smooth 3 μm thick AlMgB14 films with the RMS surface roughness to be less than 1 nm exhibit hardness of 34 GPa and modulus of elasticity of 230 GPa at 20 mN peak load.

Place, publisher, year, edition, pages
Institute of Physics Publishing (IOPP), 2016. Vol. 769, no 1, 012039
Keyword [en]
Elastic moduli, Magnetron sputtering, Pulsed laser deposition, Silicon wafers, Surface roughness, Measurements of, Peak load, Pulsed-laser deposition technique, rf-Magnetron sputtering, Si wafer, Strength characteristics, Hard coatings
National Category
Manufacturing, Surface and Joining Technology
Identifiers
URN: urn:nbn:se:kth:diva-202123DOI: 10.1088/1742-6596/769/1/012039Scopus ID: 2-s2.0-85007072470OAI: oai:DiVA.org:kth-202123DiVA: diva2:1081690
Conference
26 October 2015 through 29 October 2015
Note

QC 20170314

Available from: 2017-03-14 Created: 2017-03-14 Last updated: 2017-03-14Bibliographically approved

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