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Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering
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2013 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 545, 445-450 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
Elsevier, 2013. Vol. 545, 445-450 p.
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Engineering and Technology
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URN: urn:nbn:se:kth:diva-205390DOI: 10.1016/j.tsf.2013.07.058ISI: 000324820800072Scopus ID: 2-s2.0-84884983116OAI: oai:DiVA.org:kth-205390DiVA: diva2:1088802
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QC 20170418

Available from: 2017-04-15 Created: 2017-04-15 Last updated: 2017-04-18Bibliographically approved

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Gudmundsson, Jon Tomas
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CiteExportLink to record
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