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Low-loss ridge waveguides in thin film lithium niobate-oninsulator (LNOI) fabricated by reactive ion etching
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.
KTH, School of Engineering Sciences (SCI), Applied Physics, Quantum Electronics and Quantum Optics, QEO.
2014 (English)In: Optics InfoBase Conference Papers, OSA - The Optical Society , 2014Conference paper, (Refereed)
Abstract [en]

We report on the fabrication of waveguides in 300 nm-thick Y-cut lithium niobate on silicon through optimized reactive ion etching, yielding sidewall roughness of 22.9 nm and propagation losses of 8.62 dB/cm at 1550 nm.

Place, publisher, year, edition, pages
OSA - The Optical Society , 2014.
Keyword [en]
Electric losses, Nanophotonics, Niobium compounds, Photonics, Ridge waveguides, Silicon, Waveguides, 1550 nm, Lithium niobate, Low-loss, Propagation loss, Sidewall roughness, Silicon through, Reactive ion etching
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-207231Scopus ID: 2-s2.0-85019506040ISBN: 9781943580149 (electronic)OAI: oai:DiVA.org:kth-207231DiVA: diva2:1115891
Conference
Integrated Photonics Research, Silicon and Nanophotonics, IPRSN 2016, 18 July 2016 through 20 July 2016
Note

QC 20170627

Available from: 2017-06-27 Created: 2017-06-27 Last updated: 2017-06-27Bibliographically approved

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