Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
A New Way to Form Three-Dimensional Microstructures by Electrochemical Etching of Silicon
2001 (English)In: Materials Research Society Symposium Proceedings, ISSN 0272-9172, E-ISSN 1946-4274, Vol. 638, F821-F826 p.Article in journal (Refereed) Published
Abstract [en]

A new technique of bulk micromachining using anodic etching of (100)-oriented n-type silicon is presented. For particular conditions the transition regime between porous silicon formation and electropolishing enables the formation of high aspect ratio microtips which correspond to inverted macropore structures. This unusual property can be explained by the distortion of currant lines near the basis of formed structures. The distortion, which prevents the tip dissolution, is due to the electrical field in the space charge region at the silicon-electrolyte interface. The same property can be used to form three-dimensional microstructures. The position and shape of the structures can be defined by forming steps of a few microns depth, prior to the electrochemical etching. Then the etching parameters (HF concentration, light intensity, etching current density) are adjusted in order to electropolish the sample except where vertical walls are needed. This enables to form microstructures without a periodic pattern. The feasibility of this technique is demonstrated by forming 100 μm wide pores, free-standing beams as well as high aspect ratio micro-needles and micro-tubes.

Place, publisher, year, edition, pages
2001. Vol. 638, F821-F826 p.
Keyword [en]
Anodes, Current density, Electric currents, Electric distortion, Electric fields, Electric space charge, Electrochemistry, Electrolytes, Electrolytic polishing, Etching, Micromachining, Microstructure, Electrochemical etching
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:kth:diva-6470ISBN: - (print)OAI: oai:DiVA.org:kth-6470DiVA: diva2:11192
Note
QC 20101101Available from: 2005-09-15 Created: 2005-09-15 Last updated: 2017-12-14Bibliographically approved

Open Access in DiVA

No full text

Authority records BETA

Linnros, Jan

Search in DiVA

By author/editor
Linnros, JanJuhasz, Robert
In the same journal
Materials Research Society Symposium Proceedings
Condensed Matter Physics

Search outside of DiVA

GoogleGoogle Scholar

isbn
urn-nbn

Altmetric score

isbn
urn-nbn
Total: 45 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf