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Particle-balance models for pulsed sputtering magnetrons
KTH, School of Electrical Engineering (EES), Space and Plasma Physics. Hainan University, People ’ s Republic of China.
Universite Paris Sud.
KTH, School of Electrical Engineering (EES), Space and Plasma Physics. Université Paris, France; University of Iceland, Iceland.ORCID iD: 0000-0002-8153-3209
KTH, School of Electrical Engineering (EES), Space and Plasma Physics. (Space and Plasma Physics)
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2017 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 50, no 35, article id 354003Article in journal (Refereed) Published
Abstract [en]

The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past decade and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 μs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 μs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explores the effects of varying the magnetic field strength. The model results show that -ions contribute negligibly to the production of secondary electrons, while -ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al+-ions to the discharge current at the target surface is over 90% at 800 V. However, at 400 V the Al+-ions and Ar+-ions contribute roughly equally to the discharge current in the initial peak, while in the plateau region Ar+-ions contribute to roughly of the current. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. For the discharge with Ti target, a decrease in the B-field strength, resulted in a corresponding stepwise increase in the discharge resistivity.

Place, publisher, year, edition, pages
Institute of Physics (IOP), 2017. Vol. 50, no 35, article id 354003
National Category
Physical Sciences
Research subject
Physics
Identifiers
URN: urn:nbn:se:kth:diva-219563DOI: 10.1088/1361-6463/aa7d35ISI: 000407278500003Scopus ID: 2-s2.0-85027969051OAI: oai:DiVA.org:kth-219563DiVA, id: diva2:1163594
Funder
VINNOVA, 2014-04876
Note

QC 20180112

Available from: 2017-12-07 Created: 2017-12-07 Last updated: 2018-01-12Bibliographically approved

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Publisher's full textScopushttp://iopscience.iop.org/article/10.1088/1361-6463/aa7d35

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Huo, Chunqing

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