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Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate.
Chalmers University of Technology, Sweden.ORCID iD: 0000-0002-4437-6291
2016 (English)In: Advanced Materials, ISSN 0935-9648, E-ISSN 1521-4095, Vol. 28, no 23, p. 4658-4664Article in journal (Refereed) Published
Abstract [en]

A continuous-gradient approach of material evaporation is employed to fabricate nanostructures with varying geometric parameters, such as thickness, lateral positioning, and orientation on a single substrate. The method developed for mask lithography allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.

Place, publisher, year, edition, pages
Wiley-VCH Verlagsgesellschaft, 2016. Vol. 28, no 23, p. 4658-4664
National Category
Nano Technology Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:kth:diva-197572DOI: 10.1002/adma.201600112ISI: 000377531900012PubMedID: 27061280Scopus ID: 2-s2.0-84973614805OAI: oai:DiVA.org:kth-197572DiVA, id: diva2:1165989
Funder
Swedish Foundation for Strategic Research Knut and Alice Wallenberg Foundation
Note

QC 20171215

Available from: 2017-12-14 Created: 2017-12-14 Last updated: 2017-12-15Bibliographically approved

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