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Aberration Correction for Hard X-ray Focusing at the Nanoscale
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2017 (English)In: Advances in X-Ray/EUV Optics and Components XII / [ed] Morawe, C Khounsary, AM Goto, S, SPIE - International Society for Optical Engineering, 2017, article id UNSP 103860AConference paper, Published paper (Refereed)
Abstract [en]

We developed a corrective phase plate that enables the correction of residual aberration in reflective, diffractive, and refractive X-ray optics. The principle is demonstrated on a stack of beryllium compound refractive lenses with a numerical aperture of 0.49 x 10(-3) at three different synchrotron radiation and x-ray free-electron laser facilities. By introducing this phase plate into the beam path, we were able to correct the spherical aberration of the optical system and improve the Strehl ratio of the optics from 0.29(7) to 0.87(5), creating a diffraction-limited, large aperture, nanofocusing optics that is radiation resistant and very compact.

Place, publisher, year, edition, pages
SPIE - International Society for Optical Engineering, 2017. article id UNSP 103860A
Series
Proceedings of SPIE, ISSN 0277-786X ; 10386
Keywords [en]
x-ray optics, compound refractive lenses, aberration correction, ptychography, wavefront sensing
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Identifiers
URN: urn:nbn:se:kth:diva-220504DOI: 10.1117/12.2274030ISI: 000417334200008Scopus ID: 2-s2.0-85038942600ISBN: 978-1-5106-1230-3 ISBN: 978-1-5106-1229-7 OAI: oai:DiVA.org:kth-220504DiVA, id: diva2:1168976
Conference
Conference on Advances in XRay/ EUV Optics and Components XII held as part of the SPIE Optics + Photonics Symposium, AUG 08-09, 2017, San Diego, CA
Note

QC 20171222

Available from: 2017-12-22 Created: 2017-12-22 Last updated: 2018-01-31Bibliographically approved

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Parfeniukas, KarolisVogt, Ulrich

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