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High-aspect ratio zone plate fabrication for hard x-ray nanoimaging
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.ORCID iD: 0000-0001-7569-9408
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.ORCID iD: 0000-0002-4394-0591
2017 (English)In: Advances in X-Ray/EUV Optics and Components XII / [ed] Morawe, C Khounsary, AM Goto, S, SPIE - International Society for Optical Engineering, 2017, Vol. 10386, UNSP 103860SConference paper (Refereed)
Abstract [en]

We present our results in fabricating Fresnel zone plate optics for the NanoMAX beamline at the fourth-generation synchrotron radiation facility MAX IV, to be used in the energy range of 6-10 keV. The results and challenges of tungsten nanofabrication are discussed, and an alternative approach using metal-assisted chemical etching (MACE) of silicon is showcased. We successfully manufactured diffraction-limited zone plates in tungsten with 30 nm outermost zone width and an aspect ratio of 21:1. These optics were used for nanoimaging experiments at NanoMAX. However, we found it challenging to further improve resolution and diffraction efficiency using tungsten. High efficiency is desirable to fully utilize the advantage of increased coherence on the optics at MAX IV. Therefore, we started to investigate MACE of silicon for the nanofabrication of high-resolution and high-efficiency zone plates. The first type of structures we propose use the silicon directly as the phase-shifting material. We have achieved 6 mu m deep dense vertical structures with 100 nm linewidth. The second type of optics use iridium as the phase material. The structures in the silicon substrate act as a mold for iridium coating via atomic layer deposition (ALD). A semi-dense pattern is used with line-to-space ratio of 1:3 for a so-called frequency-doubled zone plate. This way, it is possible to produce smaller structures with the tradeoff of the additional ALD step. We have fabricated 45 nm-wide and 3.6 mu m-tall silicon/iridium structures.

Place, publisher, year, edition, pages
SPIE - International Society for Optical Engineering, 2017. Vol. 10386, UNSP 103860S
Series
Proceedings of SPIE, ISSN 0277-786X ; 10386
Keyword [en]
zone plate, high-aspect ratio, etching, RIE, MACE, tungsten, silicon, gold
National Category
Other Physics Topics
Identifiers
URN: urn:nbn:se:kth:diva-220503DOI: 10.1117/12.2272695ISI: 000417334200016Scopus ID: 2-s2.0-85038958242ISBN: 978-1-5106-1230-3 ISBN: 978-1-5106-1229-7 OAI: oai:DiVA.org:kth-220503DiVA: diva2:1169032
Conference
Conference on Advances in XRay/ EUV Optics and Components XII held as part of the SPIE Optics + Photonics Symposium, AUG 08-09, 2017, San Diego, CA
Funder
Swedish Research Council, C0242401Knut and Alice Wallenberg Foundation
Note

QC 20171222

Available from: 2017-12-22 Created: 2017-12-22 Last updated: 2018-01-09Bibliographically approved

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Parfeniukas, KarolisAkan, RabiaVogt, Ulrich

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