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Numerical Simulation of Micro-Galvanic Corrosion of Al Alloys: Effect of Chemical Factors
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science. University of Science and Technology Beijing, China.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.ORCID iD: 0000-0002-4431-0671
2017 (English)In: Journal of the Electrochemical Society, ISSN 0013-4651, E-ISSN 1945-7111, Vol. 164, no 13, C768-C778 p.Article in journal (Refereed) Published
Abstract [en]

A finite element model for simulating the propagation of micro-galvanic corrosion of Al alloys induced by intermetallic particle was established to reveal the dynamic changes including a moving dissolution boundary, deposition of reaction products and their blocking effect. This model has previously been used to study the influence of geometrical factors such as the particle size and width of the anodic ring. In this work, we explore effects of chemical factors including pH and bulk concentration of O-2 by using chemical-dependent electrochemical kinetics as input parameters. The simulations reveal that the micro-galvanic corrosion rate is slowest at pH = 6. For pH > 6, the rise of pH increases the dissolution rate of Al and also the deposition rate of Al(OH)(3), leading to a faster but more short localized Al dissolution. For pH < 6, the decline of pH accelerates Al dissolution and inhibits Al(OH)(3) deposition, leading to a faster and more long lasting Al dissolution. At pH <= 4, deposition of Al(OH)(3) becomes negligible, and localized corrosion will propagate continuously. Within the O-2 concentration range relevant for atmospheric conditions, a lower O-2 concentration in the solution leads to a slower rate of micro-galvanic corrosion.

Place, publisher, year, edition, pages
Electrochemical Society Inc , 2017. Vol. 164, no 13, C768-C778 p.
National Category
Corrosion Engineering
Identifiers
URN: urn:nbn:se:kth:diva-220868DOI: 10.1149/2.0691713jesISI: 000418409800091Scopus ID: 2-s2.0-85033671822OAI: oai:DiVA.org:kth-220868DiVA: diva2:1171701
Funder
Swedish Foundation for Strategic Research , RMA11-0090
Note

QC 20180108

Available from: 2018-01-08 Created: 2018-01-08 Last updated: 2018-01-08Bibliographically approved

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Pan, Jinshan

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