Liquid-tin-jet laser-plasma extreme ultraviolet generation
2004 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 84, no 13, 2556-2258 p.Article in journal (Refereed) Published
We demonstrate the applicability of liquid-metal jets in vacuum as regenerative targets for laser-plasma generation of extreme ultraviolet (EUV) and soft x-ray radiation. This extends the operation of liquid jet laser-plasma,sources to high-temperature, high-Z, high-density, low-vapor-pressure materials with new spectral signatures. The system is demonstrated using tin (Sn) as the target due to its strong emission around lambdaapproximate to13 nm, which makes the material suitable for EUV lithography. We show a conversion efficiency of 2.5% into (2% BW x 2pi x sr) and report quantitative measurements of the ionic/atomic as well as particulate debris emission.
Place, publisher, year, edition, pages
2004. Vol. 84, no 13, 2556-2258 p.
Calibration; Charge coupled devices; Electron beams; Electron transitions; Jets; Light emission; Light reflection; Liquid metals; Photolithography; Scanning electron microscopy; Tin; Ultraviolet radiation; X rays; Extreme ultraviolet (EUV) lithography; High-repetition-rate lasers; Liquid-metal jets; Particulate debris emission; Laser produced plasmas
IdentifiersURN: urn:nbn:se:kth:diva-7013DOI: 10.1063/1.1690874ISI: 000220591500012ScopusID: 2-s2.0-2142714542OAI: oai:DiVA.org:kth-7013DiVA: diva2:11888
QC 201008192007-04-202007-04-202012-03-22Bibliographically approved