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At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis
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2018 (English)In: Optics Express, ISSN 1094-4087, E-ISSN 1094-4087, Vol. 26, no 4, p. 4989-5004Article in journal (Refereed) Published
Abstract [en]

The current advances in new generation X-ray sources are calling for the development and improvement of high-performance optics. Techniques for high-sensitivity phase sensing and wavefront characterisation, preferably performed at-wavelength, are increasingly required for quality control, optimisation and development of such devices. We here show that the recently proposed unified modulated pattern analysis (UMPA) can be used for these purposes. We characterised two polymer X-ray refractive lenses and quantified the effect of beam damage and shape errors on their refractive properties. Measurements were performed with two different setups for UMPA and validated with conventional X-ray grating interferometry. Due to its adaptability to different setups, the ease of implementation and cost-effectiveness, we expect UMPA to find applications for high-throughput quantitative optics characterisation and wavefront sensing.

Place, publisher, year, edition, pages
Optical Society of America, 2018. Vol. 26, no 4, p. 4989-5004
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Identifiers
URN: urn:nbn:se:kth:diva-224701DOI: 10.1364/OE.26.004989ISI: 000426268500112PubMedID: 29475342Scopus ID: 2-s2.0-85042115138OAI: oai:DiVA.org:kth-224701DiVA, id: diva2:1192740
Funder
EU, FP7, Seventh Framework Programme, StG 279753
Note

QC 20180323

Available from: 2018-03-23 Created: 2018-03-23 Last updated: 2018-03-23Bibliographically approved

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Romell, Jenny
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