Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.ORCID iD: 0000-0001-7569-9408
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
Show others and affiliations
2018 (English)In: RSC Advances, ISSN 2046-2069, E-ISSN 2046-2069, Vol. 8, no 23, p. 12628-12634Article in journal (Refereed) Published
Abstract [en]

Metal-assisted chemical etching (MACE) reaction parameters were investigated for the fabrication of specially designed silicon-based X-ray zone plate nanostructures using a gold catalyst pattern and etching solutions composed of HF and H2O2. Etching depth, zone verticality and zone roughness were studied as a function of etching solution composition, temperature and processing time. Homogeneous, vertical etching with increasing depth is observed at increasing H2O2 concentrations and elevated processing temperatures, implying a balance in the hole injection and silica dissolution kinetics at the gold-silicon interface. The etching depth decreases and zone roughness increases at the highest investigated H2O2 concentration and temperature. Possible reasons for these observations are discussed based on reaction chemistry and zone plate design. Optimum MACE conditions are found at HFH2O2 concentrations of 4.7 M:0.68 M and room temperature with an etching rate of ≈0.7 μm min-1, which is about an order of magnitude higher than previous reports. Moreover, our results show that a grid catalyst design is important for successful fabrication of vertical high aspect ratio silicon nanostructures. 

Place, publisher, year, edition, pages
Royal Society of Chemistry , 2018. Vol. 8, no 23, p. 12628-12634
Keywords [en]
Aspect ratio, Charge injection, Hydrofluoric acid, Nanocatalysts, Nanostructures, Plate metal, Processing, Silica, Silicon, X ray diffraction, Etching solutions, Metal-assisted chemical etching, Processing temperature, Reaction chemistry, Reaction parameters, Silica dissolution, Silicon interface, Silicon nano structures, Etching
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-227483DOI: 10.1039/c8ra01627eScopus ID: 2-s2.0-85045188242OAI: oai:DiVA.org:kth-227483DiVA, id: diva2:1206195
Funder
Swedish Research Council
Note

Export Date: 9 May 2018; Article; CODEN: RSCAC; Correspondence Address: Vogt, U.; KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Albanova University CenterSweden; email: uvogt@kth.se; Funding details: VR, Vetenskapsrådet; Funding text: This work was supported by the Swedish Research Council. We thank Adem B. Ergul for help with the cross-section images and Jussi Rahomäki for starting with MACE in our group. QC 20180516

Available from: 2018-05-16 Created: 2018-05-16 Last updated: 2018-05-16Bibliographically approved

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full textScopus

Authority records BETA

Akan, RabiaParfeniukas, KarolisVogt, CarmenVogt, Ulrich

Search in DiVA

By author/editor
Akan, RabiaParfeniukas, KarolisVogt, CarmenToprak, M. S.Vogt, Ulrich
By organisation
Biomedical and X-ray Physics
In the same journal
RSC Advances
Physical Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 11 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf