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Micro-galvanic corrosion of Cu/Ru couple in potassium periodate (KIO4) solution
KTH, School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Chemistry, Surface and Corrosion Science. Tsinghua University, Beijing, China.
2018 (English)In: Corrosion Science, ISSN 0010-938X, E-ISSN 1879-0496, Vol. 137, p. 184-193Article in journal (Refereed) Published
Abstract [en]

This paper focuses on the study of micro-galvanic corrosion of the Cu/Ru couple in KIO4 solution. Practical nobility across the Cu/Ru interface was evaluated by Volta potential mapping, and the morphological changes were monitored by in-situ atomic force microscopy measurements during exposure in a KIO4 solution. Chemical composition of precipitated corrosion product was analyzed by Confocal Raman spectroscopy immediately after the exposure. The results show that Cu is the anode of the Cu/Ru couple, and accelerated dissolution of Cu preferentially occurs near the Cu/Ru interface. However, subsequent formation of insoluble Cu(IO3)2┬ĚnH2O leads to precipitation, which impedes further Cu corrosion.

Place, publisher, year, edition, pages
Elsevier, 2018. Vol. 137, p. 184-193
Keywords [en]
A. Electronic materials, B. AFM, B. EIS, B: Raman spectroscopy, C. Interfaces, C: Oxidation
National Category
Corrosion Engineering
Identifiers
URN: urn:nbn:se:kth:diva-227561DOI: 10.1016/j.corsci.2018.03.045ISI: 000436213400015Scopus ID: 2-s2.0-85044593921OAI: oai:DiVA.org:kth-227561DiVA, id: diva2:1206512
Note

QC 20180517

Available from: 2018-05-17 Created: 2018-05-17 Last updated: 2018-12-14Bibliographically approved

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Cheng, Jie

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