Spin-flip scattering at Al surfaces
2006 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 99, no 8, 08H701- p.Article in journal (Refereed) Published
Nonlocal measurements are performed on a multiterminal device to in situ determine the spin-diffusion length and in combination with resistivity measurements also the spin-relaxation time in Al films. By varying the thickness of Al we determine the contribution to spin relaxation from surface scattering. From the temperature dependence of the spin-diffusion length it is established that the spin relaxation is impurity dominated at low temperature. A comparison of the spin- and momentum-relaxation lengths for different thicknesses reveals that the spin-flip scattering at the surfaces is weak compared to that within the bulk of the Al films.
Place, publisher, year, edition, pages
2006. Vol. 99, no 8, 08H701- p.
Aluminum; Diffusion; Electronic equipment; Scattering; Surface treatment; Thermal effects; Al films; Spin-flip scattering; Spin-relaxation time; Surface scattering; Thin films
IdentifiersURN: urn:nbn:se:kth:diva-7469DOI: 10.1063/1.2159395ISI: 000237404200426ScopusID: 2-s2.0-33646782968OAI: oai:DiVA.org:kth-7469DiVA: diva2:12502
QC 201008132007-09-102007-09-102010-08-13Bibliographically approved