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Resistance values of aluminum oxide film in situ during anodization of aluminum by fabry-pérot interferometry
KTH, School of Engineering Sciences (SCI), Applied Physics.ORCID iD: 0000-0002-0074-3504
2017 (English)In: ECS Transactions, Electrochemical Society Inc. , 2017, no 10, p. 1221-1229Conference paper, Published paper (Refereed)
Abstract [en]

A combination of Fabry-Pérot interferometry and the DC electrochemical method have been used for the first time, in situ, to measure the resistance of aluminum oxide films in 2% sulfuric acid solution. Values of the corresponding resistance of the obtained Al2O3 film thickness were determined during anodization of aluminum (Al) in 2% H2SO4. The obtained resistance values were verified by electrochemical impedance spectroscopy (EIS) and holographic interferometry. The corresponding resistance (2.4 x109 Ohms) to the final thickness of the aluminum oxide film was found in an agreement with the resistance value that was measured by holographic interferometry, 2.54x109 Ohms, in 2% H2SO4. On the contrary, the corresponding resistance (2.4 x109 Ohms) to the final thickness of the aluminum oxide film was found twice the value of the resistance that was measured by the electrochemical impedance spectroscopy (EIS), 1.25x109 Ohms, in 2% H2SO4.

Place, publisher, year, edition, pages
Electrochemical Society Inc. , 2017. no 10, p. 1221-1229
Keywords [en]
Alumina, Electrochemical impedance spectroscopy, Holographic interferometry, Optical films, Oxide films, Spectroscopy, Al2O3 films, Aluminum (Al), Anodizations, ELectrochemical methods, Resistance values, Sulfuric acid solution, Aluminum oxide
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:kth:diva-236865DOI: 10.1149/08010.1221ecstScopus ID: 2-s2.0-85046122207ISBN: 9781607685395 (print)OAI: oai:DiVA.org:kth-236865DiVA, id: diva2:1270908
Conference
232nd ECS Meeting, 1 October 2017 through 5 October 2017
Note

QC 20181214

Available from: 2018-12-14 Created: 2018-12-14 Last updated: 2018-12-14Bibliographically approved

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Dutta, Joydeep

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  • apa
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