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Simulation of reaction-diffusion between substrate and coating during vapor deposition processes
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering.
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering.ORCID iD: 0000-0001-8797-4585
2019 (English)In: Calphad, ISSN 0364-5916, E-ISSN 1873-2984, Vol. 64, p. 278-283Article in journal (Refereed) Published
Abstract [en]

This work presents simulations of the solid state diffusion and reactions during deposition processes. Two cases are studied where the diffusion in and between coating and substrate is simulated. The processes simulated are in one case directed vapor deposition of Al and Ni on a precoated nickel-base superalloy, and in the other case chemical vapor deposition aluminization of a nickel-base superalloy. The simulations result in composition and phase-fraction profiles, which are presented and compared with experimental composition profiles. The simulation results are generally in good agreement with the experimental profiles.

Place, publisher, year, edition, pages
PERGAMON-ELSEVIER SCIENCE LTD , 2019. Vol. 64, p. 278-283
Keywords [en]
Simulation, Diffusion, Nickel-base superalloy, Chemical vapor deposition, Directed vapor deposition
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:kth:diva-247819DOI: 10.1016/j.calphad.2018.12.014ISI: 000460842600029Scopus ID: 2-s2.0-85059562570OAI: oai:DiVA.org:kth-247819DiVA, id: diva2:1299490
Note

QC 20190327

Available from: 2019-03-27 Created: 2019-03-27 Last updated: 2019-04-04Bibliographically approved

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Larsson, Henrik

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