Impact of feature-size dependent etching on the optical properties of photonic crystal devices
2008 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 103, no 9, 096106-1-096106-3 p.Article in journal (Refereed) Published
Feature size dependence in Ar/Cl-2 chemically assisted ion beam etching of InP-based photonic crystals (PhCs) and its influence on the optical properties of PhC devices operating in the band gap are investigated. The analysis of the measured quality factors, the determined mirror reflectivities, and losses of one-dimensional Fabry-Perot cavities clearly demonstrates the importance of feature-size dependent etching. The optical properties show a dramatic improvement up to a hole depth of about 3.5 mu m that is primarily due to a significant reduction in extrinsic losses. However, beyond this hole depth, the improvement is at a lower rate, which suggests that extrinsic losses, although present, are not dominant.
Place, publisher, year, edition, pages
2008. Vol. 103, no 9, 096106-1-096106-3 p.
WAVE-GUIDE; LOSSES; FABRICATION
IdentifiersURN: urn:nbn:se:kth:diva-8377DOI: 10.1063/1.2913168ISI: 000255983200189ScopusID: 2-s2.0-43949097571OAI: oai:DiVA.org:kth-8377DiVA: diva2:13682
QC 20100707. Uppdaterad från in press till published (20100707). Tidigare titel: Impact of feature size dependence on the optical properties of two-dimensional photonic crystal devices.2008-05-082008-05-082010-07-07Bibliographically approved