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Helium depth profile measurements within tungsten coatings by using Glow Discharge Optical Emission Spectrometry (GDOES)
Natl Inst Laser Plasma & Radiat Phys, 409 Atomistilor, Bucharest 077125, Romania..
Natl Inst Laser Plasma & Radiat Phys, 409 Atomistilor, Bucharest 077125, Romania..
Inst Rech Sur Fus Confinement Magnet IRFM, Cadarache, France..
KTH, School of Electrical Engineering and Computer Science (EECS), Electrical Engineering, Fusion Plasma Physics.
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2019 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 376, p. 21-24Article in journal (Refereed) Published
Abstract [en]

In the present paper results concerning the implementation of the Glow Discharge Optical Emission Spectrometry (GDOES) for measure the He depth profile within W coatings are given. The He emission line situated at 587.5 nm was used in this respect. W coating containing He up 10 at.% and with thickness of 5 pm have been obtained by Combined Magnetron Sputtering and Ion Implantation (CMSII) method. The coatings structure and morphology was investigated using Scanning Electron Microscopy (SEM) measurements. The He retention within the coatings was evaluated by using Thermal Desorption Spectroscopy (TDS). Time-of-Flight Elastic Recoil Detection Analysis (TOF ERDA) measurements has been used to determine chemical composition of the coatings. Results of TOF-ERDA measurements results were used to calibrate the GDOES equipment. Using these data the GDOES depth profiles of the He within W coatings have been obtained.

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 2019. Vol. 376, p. 21-24
Keywords [en]
Helium retention, W coatings, GDOES
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:kth:diva-262935DOI: 10.1016/j.surfcoat.2018.11.057ISI: 000488888800005Scopus ID: 2-s2.0-85057604242OAI: oai:DiVA.org:kth-262935DiVA, id: diva2:1374311
Conference
11th Asian-European International Conference on Plasma Surface Engineering (AEPSE), SEP 11-15, 2017, Jeju, SOUTH KOREA
Note

QC 20191129

Available from: 2019-11-29 Created: 2019-11-29 Last updated: 2019-11-29Bibliographically approved

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