A novel electrical and optical confinement scheme for surface emitting optoelectronic devices
2006 (English)In: WORKSHOP ON OPTICAL COMPONENTS FOR BROADBAND COMMUNICATION / [ed] Fonjallaz, PY; Pearsall, TP, BELLINGHAM, WA: SPIE-INT SOC OPTICAL ENGINEERING , 2006, Vol. 6350, 63500J-1-63500J-10 p.Conference paper (Refereed)
A novel electrical and optical confinement scheme for surface emitting optoelectronic devices is presented. The scheme is based on epitaxial regrowth of a pnp current blocking layer structure around a mesa etched in the vertical cavity region of the device. The lateral size and orientation of the mesa is defined lithographically and dry etching is used to create vertical mesa sidewalls. By orienting the mesa sidewalls in certain crystallographic directions, it is possible to selectively grow a current blocking pnp layer structure on the exposed n-type lower cladding layer of the cavity whithout obstructing the electrical injection into the active region. The concept is evaluated in 1.2-mu m GaAs-based light emitting diodes with InGaAs quantum wells. This type of structure can easily be used as the amplifying region of a vertical cavity laser, providing a good alternative to selective oxidation confinement.
Place, publisher, year, edition, pages
BELLINGHAM, WA: SPIE-INT SOC OPTICAL ENGINEERING , 2006. Vol. 6350, 63500J-1-63500J-10 p.
, Proceedings of SPIE, ISSN 0277-786X ; 6350
Mesa sidewalls; Optical confinement; Vertical cavity; Electric properties; Epitaxial growth; Light emitting diodes; Optical properties; Photolithography; Semiconductor quantum wells
Condensed Matter Physics
IdentifiersURN: urn:nbn:se:kth:diva-8624DOI: 10.1117/12.692904ISI: 000241328400014ScopusID: 2-s2.0-33749840435ISBN: 0-8194-6445-7OAI: oai:DiVA.org:kth-8624DiVA: diva2:13996
Workshop on Optical Components for Broadband Communication. Stockholm, SWEDEN. JUN 28-29, 2006
QC 20100825 QC 201110042008-06-032008-06-032011-10-04Bibliographically approved