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Comparative analysis of the plasma parameters of ECR and combined ECR plus RF discharges in the TOMAS plasma facility
Kharkov Inst Phys & Technol, Inst Plasma Phys, Natl Sci Ctr, Kharkiv, Ukraine..
LPP ERM KMS, Lab Plasma Phys, B-1000 Brussels, Belgium..
LPP ERM KMS, Lab Plasma Phys, B-1000 Brussels, Belgium.;Univ Ghent, Dept Appl Phys, B-9000 Ghent, Belgium..
Forschungszentrum Julich, Inst Energy & Climate Res Plasma Phys, Julich, Germany..
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2021 (English)In: Plasma Physics and Controlled Fusion, ISSN 0741-3335, E-ISSN 1361-6587, Vol. 63, no 12, article id 125023Article in journal (Refereed) Published
Abstract [en]

The toroidal magnetized system (TOMAS) plasma facility aims at complementary research on wall conditioning methods, plasma production and plasma-surface interaction studies. This paper explores for the first time the parameters in helium electron-cyclotron resonance (ECR) plasma and combined ECR + radio-frequency (RF) discharges in TOMAS. The ECR discharge in this work, at 2.45 GHz and 87.6 mT, is the main one for creating and maintaining the plasma, while the addition of RF power at 25 MHz allows to broaden the achievable electron temperature and density at a given gas flow, as evidenced by triple Langmuir probe measurements. This effect of the combined ECR + RF discharge provides flexibility to study particular aspects of wall conditioning techniques relevant to larger devices, or to approach plasma conditions relevant to fusion edge plasmas for particular surface interaction studies.

Place, publisher, year, edition, pages
IOP Publishing , 2021. Vol. 63, no 12, article id 125023
Keywords [en]
ECR, RF, magnetized discharge, triple probe, TOMAS
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:kth:diva-305327DOI: 10.1088/1361-6587/ac3471ISI: 000718049200001Scopus ID: 2-s2.0-85120713905OAI: oai:DiVA.org:kth-305327DiVA, id: diva2:1615777
Note

QC 20211201

Available from: 2021-12-01 Created: 2021-12-01 Last updated: 2022-06-25Bibliographically approved

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Moon, SunwooPetersson, Per

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