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Modeling of high power impulse magnetron sputtering discharges with tungsten target
Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland..
Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany..
Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden..
Tokyo Metropolitan Univ, Grad Sch Syst Design, Dept Mech Syst Engn, 6-6 Asahigaoka, Hino, Tokyo 1910065, Japan..
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2022 (English)In: Plasma sources science & technology, ISSN 0963-0252, E-ISSN 1361-6595, Vol. 31, no 6, p. 065009-, article id 065009Article in journal (Refereed) Published
Abstract [en]

The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering discharge with a tungsten target. The IRM gives the temporal variation of the various species and the average electron energy, as well as internal discharge parameters such as the ionization probability and the back-attraction probability of the sputtered species. It is shown that an initial peak in the discharge current is due to argon ions bombarding the cathode target. After the initial peak, the W+ ions become the dominating ions and remain as such to the end of the pulse. We demonstrate how the contribution of the W+ ions to the total discharge current at the target surface increases with increased discharge voltage for peak discharge current densities J (D,peak) in the range 0.33-0.73 A cm(-2). For the sputtered tungsten the ionization probability increases, while the back-attraction probability decreases with increasing discharge voltage. Furthermore, we discuss the findings in terms of the generalized recycling model and compare to experimentally determined deposition rates and find good agreement.

Place, publisher, year, edition, pages
IOP Publishing , 2022. Vol. 31, no 6, p. 065009-, article id 065009
Keywords [en]
magnetron sputtering discharge, high power impulse magnetron sputtering, sputtering, tungsten
National Category
Fusion, Plasma and Space Physics
Identifiers
URN: urn:nbn:se:kth:diva-315518DOI: 10.1088/1361-6595/ac774aISI: 000818603200001Scopus ID: 2-s2.0-85133693861OAI: oai:DiVA.org:kth-315518DiVA, id: diva2:1681848
Note

QC 20230404

Available from: 2022-07-07 Created: 2022-07-07 Last updated: 2023-04-04Bibliographically approved

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Raadu, Michael A.Brenning, NilsGudmundsson, Jon Tomas

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