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Anisotropic Magnetoresistance Evaluation of Electrodeposited Ni80Fe20 Thin Film on Silicon
Univ Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran..
Univ Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran..
Univ Tehran, Coll Engn, Adv Magnet Mat Res Ctr, Sch Met & Mat, Tehran 111554563, Iran..ORCID iD: 0000-0002-4053-6104
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.ORCID iD: 0000-0002-5672-5727
2022 (English)In: Micromachines, E-ISSN 2072-666X, Vol. 13, no 11, p. 1804-, article id 1804Article in journal (Refereed) Published
Abstract [en]

In this study, a simple growth of permalloy NiFe (Py) thin films on a semiconductive Si substrate using the electrochemical deposition method is presented. The electrodeposition was performed by applying a direct current of 2 mA/cm(2) during different times of 120 and 150 s and thin films with different thicknesses of 56 and 70 nm were obtained, respectively. The effect of Py thickness on the magnetic properties of thin films was investigated. Field emission scanning electron microscopy (FESEM), energy-dispersive X-ray spectroscopy (EDS), atomic force microscopy (AFM), ferromagnetic resonance (FMR), anisotropic magnetoresistance (AMR), and magneto-optic Kerr effect (MOKE) analyses were performed to characterize the Py thin films. It was observed that the coercivity of the Py thin film increases by increasing the thickness of the layer. Microscopic images of the layers indicated granular growth of the Py thin films with different roughness values leading to different magnetic properties. The magnetic resonance of the Py thin films was measured to fully describe the magnetic properties of the layers. The magnetoresistance ratios of deposited Py thin films at times of 120 and 150 s were obtained as 0.226% and 0.235%, respectively. Additionally, the damping constant for the deposited sample for 120 s was estimated as 1.36 x 10(-2), which is comparable to expensive sputtered layers' characteristics.

Place, publisher, year, edition, pages
MDPI AG , 2022. Vol. 13, no 11, p. 1804-, article id 1804
Keywords [en]
electrodeposition, permalloy, magnetoresistance, MOKE, AMR, FMR
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:kth:diva-321904DOI: 10.3390/mi13111804ISI: 000881259400001PubMedID: 36363825Scopus ID: 2-s2.0-85141689170OAI: oai:DiVA.org:kth-321904DiVA, id: diva2:1716665
Note

QC 20221206

Available from: 2022-12-06 Created: 2022-12-06 Last updated: 2024-01-17Bibliographically approved

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Hamawandi, Bejan

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