Diblock copolymer pattern protection by silver cluster reinforcementShow others and affiliations
2023 (English)In: Nanoscale, ISSN 2040-3364, E-ISSN 2040-3372, Vol. 15, no 38, p. 15768-15774Article in journal (Refereed) Published
Abstract [en]
Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography. The pristine micellar pattern of the diblock copolymer PS-b-P4VP degrades upon drying of a water droplet, which can be stabilized and inhibited upon deposition of silver clusters.
Place, publisher, year, edition, pages
Royal Society of Chemistry (RSC) , 2023. Vol. 15, no 38, p. 15768-15774
National Category
Materials Chemistry
Identifiers
URN: urn:nbn:se:kth:diva-338743DOI: 10.1039/d3nr03215aISI: 001075207900001PubMedID: 37740389Scopus ID: 2-s2.0-85172999645OAI: oai:DiVA.org:kth-338743DiVA, id: diva2:1808013
Note
QC 20231030
2023-10-302023-10-302023-11-15Bibliographically approved