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Confined pulsed diffuse layer charging for nanoscale electrodeposition with an STM
Laboratory for Nanometallurgy, ETH Zürich, Department of Materials, Vladimir-Prelog-Weg 1-5/10, Zürich, Switzerland.ORCID iD: 0000-0001-9980-7434
2022 (English)In: Nanoscale Advances, ISSN 25160230, Vol. 4, no 4, p. 1182-1190Article in journal (Refereed) Published
Place, publisher, year, edition, pages
Royal Society of Chemistry (RSC) , 2022. Vol. 4, no 4, p. 1182-1190
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Materials Engineering Electrical Engineering, Electronic Engineering, Information Engineering Chemical Engineering
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URN: urn:nbn:se:kth:diva-339188DOI: 10.1039/d1na00779cISI: 000747351800001PubMedID: 35308601Scopus ID: 2-s2.0-85124793939OAI: oai:DiVA.org:kth-339188DiVA, id: diva2:1809872
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QC 20231106

Available from: 2023-11-06 Created: 2023-11-06 Last updated: 2023-11-06Bibliographically approved

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Publisher's full textPubMedScopushttps://doi.org/10.1039%2Fd1na00779c

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Reiser, Alain

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