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Confined pulsed diffuse layer charging for nanoscale electrodeposition with an STM
Aarts, Mark
Reiser, Alain
Laboratory for Nanometallurgy, ETH Zürich, Department of Materials, Vladimir-Prelog-Weg 1-5/10, Zürich, Switzerland.
ORCID iD:
0000-0001-9980-7434
Spolenak, Ralph
Alarcon-Llado, Esther
2022 (English)
In:
Nanoscale Advances, ISSN 25160230, Vol. 4, no 4, p. 1182-1190
Article in journal (Refereed) Published
Place, publisher, year, edition, pages
Royal Society of Chemistry (RSC) , 2022. Vol. 4, no 4, p. 1182-1190
National Category
Materials Engineering Electrical Engineering, Electronic Engineering, Information Engineering Chemical Engineering
Identifiers
URN:
urn:nbn:se:kth:diva-339188
DOI:
10.1039/d1na00779c
ISI:
000747351800001
PubMedID:
35308601
Scopus ID:
2-s2.0-85124793939
OAI: oai:DiVA.org:kth-339188
DiVA, id:
diva2:1809872
Note
QC 20231106
Available from:
2023-11-06
Created:
2023-11-06
Last updated:
2023-11-06
Bibliographically approved
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https://doi.org/10.1039%2Fd1na00779c
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Reiser, Alain
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ieee
modern-language-association-8th-edition
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apa
ieee
modern-language-association-8th-edition
vancouver
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