Maskless selective electrochemically assisted wet etching of metal layers for 3D micromachined SOI RF MEMS devices
2008 (English)In: MEMS 2008: 21ST IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, New York: IEEE , 2008, 383-386 p.Conference paper (Refereed)
This paper presents a novel method for selective local removal of metal layers using maskless, electrochemically assisted wet etching. This method has been developed, investigated and successfully applied to the fabrication of three-dimensional micromachined silicon-on-insulator-based radio-frequency transmission lines with embedded laterally actuated microswitches, consisting of a silicon core covered by a gold metallization layer. The full-wafer sputtered metallization layer must be locally removed to guarantee a well defined, low-reflections and low-loss signal propagation in the transmission line. Gold areas to be etch are exposed to a 1.2 V potential difference to a saturated calomel reference electrode in a NaCl(aq) solution. Further, the selective removal of the metallization on the stoppers of laterally moving electrostatic actuators has been shown to drastically reduce the mechanical wear on the stopper tip.
Place, publisher, year, edition, pages
New York: IEEE , 2008. 383-386 p.
, PROCEEDINGS: IEEE MICRO ELECTRO MECHANICAL SYSTEMS, ISSN 1084-6999
Actuators; Bandpass filters; Composite micromechanics; Electric lines; Electrochemical electrodes; Electrostatic actuators; Etching; Gold; Mechanical engineering; Mechanics; Mechatronics; MEMS; Metal recovery; Metallizing; Metals; Nonmetals; Optical design; Power transmission; Radio broadcasting; Radio transmission; Reactive ion etching; Silicon; Silicon wafers; Sodium chloride; Three dimensional; Transmission line theory; Wet etching
IdentifiersURN: urn:nbn:se:kth:diva-13767DOI: 10.1109/MEMSYS.2008.4443673ISI: 000253356900096ScopusID: 2-s2.0-50149093285ISBN: 1084-6999 978-1-4244-1792-6OAI: oai:DiVA.org:kth-13767DiVA: diva2:327202
21st IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2008) Tucson, AZ, JAN 13-17, 2008
QC 201110132010-06-282010-06-282012-01-10Bibliographically approved