Interaction of NiSi with dopants for metallic source/drain applications
2010 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 28, no 1, C1I1-C1I11 p.Article in journal (Refereed) Published
This work has a focus on NiSi as a possible metallic contact for aggressively scaled complementary metal oxide semiconductor devices. As the bulk work function of NiSi lies close to the middle of Si bandgap, the Schottky barrier height (SBH) of NiSi is rather large for both electron (similar to 0.65 eV) and hole (similar to 0.45 eV). Different approaches have therefore been intensively investigated in the literature aiming at reducing the effective SBH: dopant segregation (DS), surface passivation (SP), and alloying, in order to improve the carrier injection into the conduction channel of a field-effect transistor. The present work explores DS using B and As for the NiSi/Si contact system. The effects of C and N implantation into Si substrate prior to the NiSi formation are examined, and it is found that the presence of C yields positive effects in helping reduce the effective SBH to 0.1-0.2 eV for both conduction polarities. A combined use of DS or SP with alloying could be considered for more effective control of effective SBH, but an examination of undesired compound formation and its probable consequences is necessary. Furthermore, an analysis of the metal silicides that have a small "intrinsic" SBH reveals that only a very small number of them are of practical interest as most of the silicides require either a high formation temperature or possess a high specific resistivity.
Place, publisher, year, edition, pages
2010. Vol. 28, no 1, C1I1-C1I11 p.
alloying, carbon, charge injection, electrical resistivity, elemental semiconductors, energy gap, field effect transistors, impurity distribution, ion implantation, nickel alloys, nitrogen, passivation, Schottky barriers, segregation, silicon, silicon alloys, work function, SCHOTTKY-BARRIER HEIGHT, SILICON-CARBON SOURCE/DRAIN, SHALLOW JUNCTION FORMATION, OXIDE-SEMICONDUCTOR TECHNOLOGY, NITROGEN ION-IMPLANTATION, FIELD-EFFECT TRANSISTORS, FULLY SILICIDED GATES, N-CHANNEL MOSFETS, CONTACT TECHNOLOGY, HIGH-PERFORMANCE
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-14028DOI: 10.1116/1.3248267ISI: 000275511800013ScopusID: 2-s2.0-77949392162OAI: oai:DiVA.org:kth-14028DiVA: diva2:329193
QC 201101142010-07-082010-07-082011-01-14Bibliographically approved