Characterization of heteroepitaxial Na0.5K0.5NbO3/La0.5Sr0.5CoO3 electro-optical cell
2005 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 86, no 6, 062901-1-062901-3 p.Article in journal (Refereed) Published
Heteroepitaxial Na0.5K0.5NbO3(1.5 mum)/La0.5Sr0.5CoO3(0.5 mum) (NKN/LSCO) films were grown on an Al2O3(0112) single crystal (r-cut sapphire) by rf-magnetron sputtering (NKN) and pulsed laser deposition (LSCO) techniques. Prism coupling waveguide refractometry has been employed to characterize vertical capacitive electro-optical cells with 2 X 8 mm(2) semitransparent Au top electrodes. Fitting reflectivity spectra to Fresnel formulas yields extraordinary and ordinary refractive indices n(e) = 2.232 and n(o) = 2.234 as well as electro-optic coefficient r(13) = 17.4 pm/V. Dispersion of the refraction index follows the Sellmeier formula n(2) = 1 + 3.46/[1-(244 nm/lambda)(2)] in the range from 400 nm to 850 nm.
Place, publisher, year, edition, pages
2005. Vol. 86, no 6, 062901-1-062901-3 p.
na0.5k0.5nbo3 thin-films, chemical-vapor-deposition, pulsed-laser deposition, knbo3 single-crystal, growth, sapphire
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-14571DOI: 10.1063/1.1861121ISI: 000227355200054ScopusID: 2-s2.0-18644386312OAI: oai:DiVA.org:kth-14571DiVA: diva2:332612
QC 201005252010-08-052010-08-052010-10-15Bibliographically approved